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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F12%3A00382104%21RIV13-AV0-68378271
rdf:type
skos:Concept n14:Vysledek
rdfs:seeAlso
http://dx.doi.org/10.1016/j.apsusc.2012.02.042
dcterms:description
Utilizing pulsed laser deposition technique combined with the radio-frequency discharge (between the target and the substrate), we were able to grow polycrystalline titanium dioxide layers (anatase, rutile) at substrate temperatures 85 °C and 150 °C. Besides the discharge no additional substrate heating was applied. The layers were prepared from pure titanium and titanium dioxide targets. To optimize deposition conditions, the oxygen background pressure, fluence (from 2 J cm2 to 9 J cm2), and discharge power were varied. Silicon wafers (1 1 1), fused silica, and polyethylene tubes were used as substrates. The layers’ crystalline structure was determined by X-ray diffraction. Atomic force microscopy was used to characterize the surface properties. Utilizing pulsed laser deposition technique combined with the radio-frequency discharge (between the target and the substrate), we were able to grow polycrystalline titanium dioxide layers (anatase, rutile) at substrate temperatures 85 °C and 150 °C. Besides the discharge no additional substrate heating was applied. The layers were prepared from pure titanium and titanium dioxide targets. To optimize deposition conditions, the oxygen background pressure, fluence (from 2 J cm2 to 9 J cm2), and discharge power were varied. Silicon wafers (1 1 1), fused silica, and polyethylene tubes were used as substrates. The layers’ crystalline structure was determined by X-ray diffraction. Atomic force microscopy was used to characterize the surface properties.
dcterms:title
PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers
skos:prefLabel
PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers
skos:notation
RIV/68378271:_____/12:00382104!RIV13-AV0-68378271
n14:predkladatel
n15:ico%3A68378271
n3:aktivita
n12:S n12:Z
n3:aktivity
S, Z(AV0Z10100522)
n3:cisloPeriodika
23
n3:dodaniDat
n8:2013
n3:domaciTvurceVysledku
n6:4619048 n6:7895712
n3:druhVysledku
n11:J
n3:duvernostUdaju
n18:S
n3:entitaPredkladatele
n16:predkladatel
n3:idSjednocenehoVysledku
158923
n3:idVysledku
RIV/68378271:_____/12:00382104
n3:jazykVysledku
n10:eng
n3:klicovaSlova
pulsed laser deposition; titanium dioxide,; photocatalysis,; RF discharge; thin films
n3:klicoveSlovo
n4:thin%20films n4:titanium%20dioxide n4:pulsed%20laser%20deposition n4:photocatalysis n4:RF%20discharge
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[730686F5BA1A]
n3:nazevZdroje
Applied Surface Science
n3:obor
n5:BM
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
3
n3:rokUplatneniVysledku
n8:2012
n3:svazekPeriodika
258
n3:tvurceVysledku
Remsa, J. Jelínek, Miroslav Mikšovský, Jan
n3:wos
000307241800047
n3:zamer
n17:AV0Z10100522
s:issn
0169-4332
s:numberOfPages
4