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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F12%3A00377074%21RIV13-TA0-68378271
rdf:type
n11:Vysledek skos:Concept
dcterms:description
The present paper is focused on time-resolved diagnostics of the simultaneous combination of dual mid frequency and dual-high power impulse magnetron sputtering discharges (so-called hybrid-dual-HiPIMS systems). The magnetrons in dual configuration are electrically confined, i.e. electrodes are alternately operated as an anode–cathode (and vice versa) during the sputtering. The dual MF discharge causes a pre-ionization effect which is an important feature because of: (i) a significant reduction of the working pressure by more than one order of magnitude, (ii) an increase of electron and ion energy, and (iii) an increase of the deposition rate. The time-resolved IVDF measurements revealed that ions with high energy generated at the cathode arrive at the substrate position about 25–30 μs after the HiPIMS pulse ignition. The effect of the hybrid system is illustrated on the deposition of Ti–Cu films. The present paper is focused on time-resolved diagnostics of the simultaneous combination of dual mid frequency and dual-high power impulse magnetron sputtering discharges (so-called hybrid-dual-HiPIMS systems). The magnetrons in dual configuration are electrically confined, i.e. electrodes are alternately operated as an anode–cathode (and vice versa) during the sputtering. The dual MF discharge causes a pre-ionization effect which is an important feature because of: (i) a significant reduction of the working pressure by more than one order of magnitude, (ii) an increase of electron and ion energy, and (iii) an increase of the deposition rate. The time-resolved IVDF measurements revealed that ions with high energy generated at the cathode arrive at the substrate position about 25–30 μs after the HiPIMS pulse ignition. The effect of the hybrid system is illustrated on the deposition of Ti–Cu films.
dcterms:title
Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering
skos:prefLabel
Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering
skos:notation
RIV/68378271:_____/12:00377074!RIV13-TA0-68378271
n11:predkladatel
n20:ico%3A68378271
n4:aktivita
n9:Z n9:P
n4:aktivity
P(GA202/07/0044), P(GA202/09/0800), P(GAP205/11/0386), P(GP202/09/P159), P(TA01010517), Z(AV0Z10100522)
n4:cisloPeriodika
11-12
n4:dodaniDat
n14:2013
n4:domaciTvurceVysledku
n17:9254927 n17:2296268
n4:druhVysledku
n16:J
n4:duvernostUdaju
n13:S
n4:entitaPredkladatele
n18:predkladatel
n4:idSjednocenehoVysledku
133151
n4:idVysledku
RIV/68378271:_____/12:00377074
n4:jazykVysledku
n19:eng
n4:klicovaSlova
dual magnetron; HiPIMS; MF discharge; Ti-Cu films; IVDF; XRD
n4:klicoveSlovo
n8:XRD n8:dual%20magnetron n8:IVDF n8:Ti-Cu%20films n8:HiPIMS n8:MF%20discharge
n4:kodStatuVydavatele
CH - Švýcarská konfederace
n4:kontrolniKodProRIV
[C89FAAFE47A1]
n4:nazevZdroje
Surface and Coatings Technology
n4:obor
n7:BL
n4:pocetDomacichTvurcuVysledku
2
n4:pocetTvurcuVysledku
9
n4:projekt
n10:GA202%2F07%2F0044 n10:TA01010517 n10:GA202%2F09%2F0800 n10:GAP205%2F11%2F0386 n10:GP202%2F09%2FP159
n4:rokUplatneniVysledku
n14:2012
n4:svazekPeriodika
206
n4:tvurceVysledku
Hippler, R. Tichý, M. Wulff, H. Hubička, Zdeněk Čada, Martin Drache, S. Bogdanowicz, R. Straňák, V. Herrendorf, A.-P.
n4:wos
000301017300010
n4:zamer
n15:AV0Z10100522
s:issn
0257-8972
s:numberOfPages
9
n5:doi
10.1016/j.surfcoat.2011.11.043