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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F11%3A00390588%21RIV13-GA0-68378271
rdf:type
n12:Vysledek skos:Concept
dcterms:description
Ultrathin nanostructured silver films exhibit unusual properties and performances. Functional properties of the film depend strongly on the nanostructure that can be manipulated by varying nucleation and growth conditions, which are in the case of RF magnetron sputtering closely related to plasma parameters. The sputtering process and the film growth are significantly influenced by the mass ratio of deposited atoms and sputtering gas ions. Deposition conditions promoting the growth of nanostructured film can be established via varying plasma parameters, i.e. mass, energy and flux of atoms and ions impinging the substrate and the ratio of atoms and ions. Ultrathin nanostructured silver films exhibit unusual properties and performances. Functional properties of the film depend strongly on the nanostructure that can be manipulated by varying nucleation and growth conditions, which are in the case of RF magnetron sputtering closely related to plasma parameters. The sputtering process and the film growth are significantly influenced by the mass ratio of deposited atoms and sputtering gas ions. Deposition conditions promoting the growth of nanostructured film can be established via varying plasma parameters, i.e. mass, energy and flux of atoms and ions impinging the substrate and the ratio of atoms and ions.
dcterms:title
In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film
skos:prefLabel
In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film
skos:notation
RIV/68378271:_____/11:00390588!RIV13-GA0-68378271
n12:predkladatel
n13:ico%3A68378271
n3:aktivita
n16:Z n16:P
n3:aktivity
P(GAP108/11/0958), P(GAP108/11/1298), P(GP202/09/P324), P(MEB091125), Z(AV0Z10100522)
n3:dodaniDat
n14:2013
n3:domaciTvurceVysledku
n11:9640495 n11:8638519 n11:7772629 n11:9269606 n11:7433514
n3:druhVysledku
n7:O
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
205032
n3:idVysledku
RIV/68378271:_____/11:00390588
n3:jazykVysledku
n6:eng
n3:klicovaSlova
silver; magnetron sputtering; in-situ monitoring; plasma characterization
n3:klicoveSlovo
n8:in-situ%20monitoring n8:plasma%20characterization n8:magnetron%20sputtering n8:silver
n3:kontrolniKodProRIV
[AC4CA5D5C687]
n3:obor
n4:BM
n3:pocetDomacichTvurcuVysledku
5
n3:pocetTvurcuVysledku
8
n3:projekt
n10:GAP108%2F11%2F1298 n10:GP202%2F09%2FP324 n10:GAP108%2F11%2F0958 n10:MEB091125
n3:rokUplatneniVysledku
n14:2011
n3:tvurceVysledku
Musil, Jindřich Lančok, Ján Novotný, Michal Fekete, Ladislav Čekada, M. Pokorný, P. Bulíř, Jiří Piksová, K.
n3:zamer
n17:AV0Z10100522