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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F11%3A00359397%21RIV12-AV0-68378271
rdf:type
n13:Vysledek skos:Concept
dcterms:description
In the present work the amorphous hydrogenated silicon-carbide (a-SiC:H) films with different C/Si ratio were prepared at room temperature using DC magnetron sputtering in two ways: (i) sputtering of silicon target; (ii) sputtering of SiC target, both in the gas mixture of Ar and CH4. In the latter case the films contained less hydrogen at the same C/Si ratio. The mechanical and tribological properties of these films were studied to find their optimum combination. The hardness, elastic modulus (nanoindentation), intrinsic stress (Stoney's formula) and coefficient of friction (pin on disc tribometer) were examined in dependence on the technological parameters, film structure and composition (Raman spectra, electron probe microanalysis). In the present work the amorphous hydrogenated silicon-carbide (a-SiC:H) films with different C/Si ratio were prepared at room temperature using DC magnetron sputtering in two ways: (i) sputtering of silicon target; (ii) sputtering of SiC target, both in the gas mixture of Ar and CH4. In the latter case the films contained less hydrogen at the same C/Si ratio. The mechanical and tribological properties of these films were studied to find their optimum combination. The hardness, elastic modulus (nanoindentation), intrinsic stress (Stoney's formula) and coefficient of friction (pin on disc tribometer) were examined in dependence on the technological parameters, film structure and composition (Raman spectra, electron probe microanalysis).
dcterms:title
Mechanical and tribological properties of coatings sputtered from SiC target in the presence of CH4 gas Mechanical and tribological properties of coatings sputtered from SiC target in the presence of CH4 gas
skos:prefLabel
Mechanical and tribological properties of coatings sputtered from SiC target in the presence of CH4 gas Mechanical and tribological properties of coatings sputtered from SiC target in the presence of CH4 gas
skos:notation
RIV/68378271:_____/11:00359397!RIV12-AV0-68378271
n13:predkladatel
n14:ico%3A68378271
n3:aktivita
n11:P n11:N n11:Z
n3:aktivity
N, P(1M06002), P(KAN301370701), Z(AV0Z10100522)
n3:cisloPeriodika
11
n3:dodaniDat
n19:2012
n3:domaciTvurceVysledku
n10:5585457 n10:6658776 n10:5662281 n10:5193222 n10:3966208
n3:druhVysledku
n12:J
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n16:predkladatel
n3:idSjednocenehoVysledku
211219
n3:idVysledku
RIV/68378271:_____/11:00359397
n3:jazykVysledku
n8:eng
n3:klicovaSlova
amorphous SiC films; sputtering; hardness; coefficient of friction; Raman spectra
n3:klicoveSlovo
n4:Raman%20spectra n4:sputtering n4:hardness n4:coefficient%20of%20friction n4:amorphous%20SiC%20films
n3:kodStatuVydavatele
CH - Švýcarská konfederace
n3:kontrolniKodProRIV
[08B07F7EA0BA]
n3:nazevZdroje
Surface and Coatings Technology
n3:obor
n18:BM
n3:pocetDomacichTvurcuVysledku
5
n3:pocetTvurcuVysledku
7
n3:projekt
n9:1M06002 n9:KAN301370701
n3:rokUplatneniVysledku
n19:2011
n3:svazekPeriodika
205
n3:tvurceVysledku
Vorlíček, Vladimír Suchánek, J. Boháč, Petr Čtvrtlík, Radim Bláhová, O. Jastrabík, Lubomír Kulykovskyy, Valeriy
n3:wos
000287906900005
n3:zamer
n20:AV0Z10100522
s:issn
0257-8972
s:numberOfPages
6
n17:doi
10.1016/j.surfcoat.2010.11.057