This HTML5 document contains 46 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
dctermshttp://purl.org/dc/terms/
n16http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n6http://linked.opendata.cz/ontology/domain/vavai/
n14http://linked.opendata.cz/resource/domain/vavai/zamer/
shttp://schema.org/
n5http://linked.opendata.cz/ontology/domain/vavai/riv/
skoshttp://www.w3.org/2004/02/skos/core#
n17http://bibframe.org/vocab/
n18http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F68378271%3A_____%2F10%3A00438332%21RIV15-AV0-68378271/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n11http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n8http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n15http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n9http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n13http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n12http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n10http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F10%3A00438332%21RIV15-AV0-68378271
rdf:type
skos:Concept n6:Vysledek
dcterms:description
The paper reports on thermal stability of alumina thin films containing gamma-Al2O3 phase and its conversion to a thermodynamically stable alpha-Al2O3 phase during a post-deposition equilibrium thermal annealing. The films were prepared by reactive magnetron sputtering and subsequently post-deposition annealing was carried out in air at temperatures ranging from 700 degrees C to 1150 degrees C and annealing times up to 5 h using a thermogravimetric system. The evolution of the structure was investigated by means of X-ray diffraction after cooling down of the films. It was found that (1) the nanocrystalline gamma-Al2O3 phase in the films is thermally stable up to 1000 degrees C even after 5 h of annealing, (2) the nanocrystalline theta-Al2O3 phase was observed in a narrow time and temperature region at >= 1050 degrees C, and (3) annealing at 1100 degrees C for 2 h resulted in a dominance of the alpha-Al2O3 phase only in the films with a sufficient thickness. The paper reports on thermal stability of alumina thin films containing gamma-Al2O3 phase and its conversion to a thermodynamically stable alpha-Al2O3 phase during a post-deposition equilibrium thermal annealing. The films were prepared by reactive magnetron sputtering and subsequently post-deposition annealing was carried out in air at temperatures ranging from 700 degrees C to 1150 degrees C and annealing times up to 5 h using a thermogravimetric system. The evolution of the structure was investigated by means of X-ray diffraction after cooling down of the films. It was found that (1) the nanocrystalline gamma-Al2O3 phase in the films is thermally stable up to 1000 degrees C even after 5 h of annealing, (2) the nanocrystalline theta-Al2O3 phase was observed in a narrow time and temperature region at >= 1050 degrees C, and (3) annealing at 1100 degrees C for 2 h resulted in a dominance of the alpha-Al2O3 phase only in the films with a sufficient thickness.
dcterms:title
Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering
skos:prefLabel
Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering
skos:notation
RIV/68378271:_____/10:00438332!RIV15-AV0-68378271
n5:aktivita
n9:Z
n5:aktivity
Z(AV0Z10100520), Z(MSM4977751302)
n5:cisloPeriodika
3
n5:dodaniDat
n10:2015
n5:domaciTvurceVysledku
n16:9269606
n5:druhVysledku
n12:J
n5:duvernostUdaju
n8:S
n5:entitaPredkladatele
n18:predkladatel
n5:idSjednocenehoVysledku
292741
n5:idVysledku
RIV/68378271:_____/10:00438332
n5:jazykVysledku
n15:eng
n5:klicovaSlova
Al2O3 (alumina); annealing; thermal stability; nanocrystalline material; sputtering
n5:klicoveSlovo
n11:annealing n11:nanocrystalline%20material n11:Al2O3%20%28alumina%29 n11:thermal%20stability n11:sputtering
n5:kodStatuVydavatele
NL - Nizozemsko
n5:kontrolniKodProRIV
[8710DF53306A]
n5:nazevZdroje
Applied Surface Science
n5:obor
n13:BM
n5:pocetDomacichTvurcuVysledku
1
n5:pocetTvurcuVysledku
6
n5:rokUplatneniVysledku
n10:2010
n5:svazekPeriodika
257
n5:tvurceVysledku
Zeman, P. Prokšová, Š. Šašek, M. Blažek, J. Čerstvý, R. Musil, Jindřich
n5:wos
000281941900068
n5:zamer
n14:MSM4977751302 n14:AV0Z10100520
s:issn
0169-4332
s:numberOfPages
5
n17:doi
10.1016/j.apsusc.2010.07.107