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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F10%3A00351378%21RIV11-GA0-68378271
rdf:type
n7:Vysledek skos:Concept
dcterms:description
The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode of sputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate φO2, magnetron voltage Ud and constant power Pd=400W delivered to the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates φO2=φAr. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films. The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode of sputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate φO2, magnetron voltage Ud and constant power Pd=400W delivered to the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates φO2=φAr. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films.
dcterms:title
Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina
skos:prefLabel
Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina
skos:notation
RIV/68378271:_____/10:00351378!RIV11-GA0-68378271
n3:aktivita
n13:Z n13:P
n3:aktivity
P(GP202/09/P324), P(IAA100100718), P(KAN400100653), Z(AV0Z10100522)
n3:cisloPeriodika
11
n3:dodaniDat
n11:2011
n3:domaciTvurceVysledku
n9:7772629 n9:7433514 n9:9640495 n9:7464045 n9:9269606
n3:druhVysledku
n16:J
n3:duvernostUdaju
n12:S
n3:entitaPredkladatele
n4:predkladatel
n3:idSjednocenehoVysledku
260359
n3:idVysledku
RIV/68378271:_____/10:00351378
n3:jazykVysledku
n18:eng
n3:klicovaSlova
aluminium oxide; ion-energy distribution function; magnetron; mass spectrometry; pulsed discharges
n3:klicoveSlovo
n10:magnetron n10:aluminium%20oxide n10:pulsed%20discharges n10:ion-energy%20distribution%20function n10:mass%20spectrometry
n3:kodStatuVydavatele
DE - Spolková republika Německo
n3:kontrolniKodProRIV
[09E0DFD52C47]
n3:nazevZdroje
Plasma Processes and Polymers
n3:obor
n17:BM
n3:pocetDomacichTvurcuVysledku
5
n3:pocetTvurcuVysledku
5
n3:projekt
n15:IAA100100718 n15:KAN400100653 n15:GP202%2F09%2FP324
n3:rokUplatneniVysledku
n11:2010
n3:svazekPeriodika
7
n3:tvurceVysledku
Pokorný, Petr Musil, Jindřich Bulíř, Jiří Lančok, Ján Novotný, Michal
n3:wos
000285212000004
n3:zamer
n14:AV0Z10100522
s:issn
1612-8850
s:numberOfPages
5