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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F10%3A00349017%21RIV12-AV0-68378271
rdf:type
skos:Concept n17:Vysledek
dcterms:description
We report on an extensive study of the deposition of titanium dioxide layers by pulsed laser deposition at either room temperature or at 200°C (300°C, 400°C, 500°C) from pure titanium and titanium dioxide targets. Some amorphous samples were annealed by the rapid thermal annealing method. The study is focused on the effect of variation of pressure of the reactive oxygen and the inert argon atmospheres, and the mixtures of both. The laser fluency varied in the range 2 J/cm2 to 9 J/cm2. The crystalline structure was characterized by X-ray diffraction and Raman Spectroscopy and for the study of the surface properties, atomic force microscopy was used. The TiO2 photocatalytic characteristics were determined using 4-chlorphenol solution degradation evaluated by pH measurement. Polycrystalline (anatase, rutile, and brookite) and amorphous layers exhibiting photocatalytic behavior were obtained at low substrate temperatures (200°C). We report on an extensive study of the deposition of titanium dioxide layers by pulsed laser deposition at either room temperature or at 200°C (300°C, 400°C, 500°C) from pure titanium and titanium dioxide targets. Some amorphous samples were annealed by the rapid thermal annealing method. The study is focused on the effect of variation of pressure of the reactive oxygen and the inert argon atmospheres, and the mixtures of both. The laser fluency varied in the range 2 J/cm2 to 9 J/cm2. The crystalline structure was characterized by X-ray diffraction and Raman Spectroscopy and for the study of the surface properties, atomic force microscopy was used. The TiO2 photocatalytic characteristics were determined using 4-chlorphenol solution degradation evaluated by pH measurement. Polycrystalline (anatase, rutile, and brookite) and amorphous layers exhibiting photocatalytic behavior were obtained at low substrate temperatures (200°C).
dcterms:title
Physical and photocatalytic properties of laser fabricated crystalline TiO2 at low temperatures Physical and photocatalytic properties of laser fabricated crystalline TiO2 at low temperatures
skos:prefLabel
Physical and photocatalytic properties of laser fabricated crystalline TiO2 at low temperatures Physical and photocatalytic properties of laser fabricated crystalline TiO2 at low temperatures
skos:notation
RIV/68378271:_____/10:00349017!RIV12-AV0-68378271
n4:aktivita
n12:Z
n4:aktivity
Z(AV0Z10100522), Z(MSM6840770012)
n4:cisloPeriodika
3
n4:dodaniDat
n10:2012
n4:domaciTvurceVysledku
n7:5662281 n7:5799015 n7:5035139
n4:druhVysledku
n16:J
n4:duvernostUdaju
n11:S
n4:entitaPredkladatele
n13:predkladatel
n4:idSjednocenehoVysledku
278906
n4:idVysledku
RIV/68378271:_____/10:00349017
n4:jazykVysledku
n15:eng
n4:klicovaSlova
pulsed laser deposition; TiO2; contact angle; photocatalytic properties; thin films
n4:klicoveSlovo
n6:contact%20angle n6:pulsed%20laser%20deposition n6:thin%20films n6:photocatalytic%20properties n6:TiO2
n4:kodStatuVydavatele
RO - Rumunsko
n4:kontrolniKodProRIV
[BA804A02B273]
n4:nazevZdroje
Journal of Optoelectronics and Advanced Materials
n4:obor
n5:BM
n4:pocetDomacichTvurcuVysledku
3
n4:pocetTvurcuVysledku
8
n4:rokUplatneniVysledku
n10:2010
n4:svazekPeriodika
12
n4:tvurceVysledku
Jelínek, M. Mikšovský, J. Sváta, V. Vymětalová, V. Studnička, Václav Remsa, Jan Kocourek, T. Vorlíček, Vladimír
n4:wos
000277827900068
n4:zamer
n14:AV0Z10100522 n14:MSM6840770012
s:issn
1454-4164
s:numberOfPages
4