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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F09%3A00334026%21RIV10-MSM-68378271
rdf:type
skos:Concept n18:Vysledek
dcterms:description
We present results of damage studies conducted at the Free Electron LASer in Hamburg (FLASH) facility with 13.5 nm (91.8 eV) and 7 nm (177.1 eV) radiations. The laser beam was focused on a sample of 890-nm-thick amorphous carbon coated on a silicon wafer mimicking a x-ray mirror. The fluence threshold for graphitization was determined for different grazing angles above and below the critical angle. The observed angular dependence of F-th is explained by the variation in absorption depth and reflectivity. Moreover, the absorbed local dose needed for the phase transition leading to graphitization is shown to vary with the radiation wavelength. We present results of damage studies conducted at the Free Electron LASer in Hamburg (FLASH) facility with 13.5 nm (91.8 eV) and 7 nm (177.1 eV) radiations. The laser beam was focused on a sample of 890-nm-thick amorphous carbon coated on a silicon wafer mimicking a x-ray mirror. The fluence threshold for graphitization was determined for different grazing angles above and below the critical angle. The observed angular dependence of F-th is explained by the variation in absorption depth and reflectivity. Moreover, the absorbed local dose needed for the phase transition leading to graphitization is shown to vary with the radiation wavelength.
dcterms:title
Damage of amorphous carbon induced by soft x-ray femtosecond pulses above and below the critical angle Damage of amorphous carbon induced by soft x-ray femtosecond pulses above and below the critical angle
skos:prefLabel
Damage of amorphous carbon induced by soft x-ray femtosecond pulses above and below the critical angle Damage of amorphous carbon induced by soft x-ray femtosecond pulses above and below the critical angle
skos:notation
RIV/68378271:_____/09:00334026!RIV10-MSM-68378271
n3:aktivita
n4:Z n4:P
n3:aktivity
P(IAA400100701), P(IAAX00100903), P(KAN300100702), P(LA08024), P(LC510), P(LC528), Z(AV0Z10100523)
n3:cisloPeriodika
3
n3:dodaniDat
n6:2010
n3:domaciTvurceVysledku
n15:8434050 n15:6173047 n15:2712679 n15:3274713
n3:druhVysledku
n13:J
n3:duvernostUdaju
n10:S
n3:entitaPredkladatele
n16:predkladatel
n3:idSjednocenehoVysledku
308997
n3:idVysledku
RIV/68378271:_____/09:00334026
n3:jazykVysledku
n17:eng
n3:klicovaSlova
amorphous state; carbon; coatings; graphitisation; laser beam effects; nanostructured materials; phase transformations; reflectivity
n3:klicoveSlovo
n9:nanostructured%20materials n9:amorphous%20state n9:carbon n9:coatings n9:graphitisation n9:laser%20beam%20effects n9:reflectivity n9:phase%20transformations
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[5E0931D47D45]
n3:nazevZdroje
Applied Physics Letters
n3:obor
n12:BH
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
16
n3:projekt
n7:KAN300100702 n7:IAA400100701 n7:IAAX00100903 n7:LC528 n7:LC510 n7:LA08024
n3:rokUplatneniVysledku
n6:2009
n3:svazekPeriodika
95
n3:tvurceVysledku
Jurek, M. Störmer, M. Tschentscher, T. Hájková, Věra Wabnitz, H. Juha, Libor Sobierajski, R. Chalupský, Jaromír Toleikis, S. Gleeson, A. J. Tiedtke, K. Vyšín, Luděk Gaudin, J. Altapova, V. Burian, T. Sinn, H.
n3:wos
000268405300011
n3:zamer
n14:AV0Z10100523
s:issn
0003-6951
s:numberOfPages
3