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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F08%3A00319735%21RIV09-AV0-68378271
rdf:type
skos:Concept n17:Vysledek
dcterms:description
Na je na neozářeném povrchu v elementární a oxidové vazbě. Tento stav se nemění při ozařování elektrony. U K jsou zřejmé větší změny. Na neozářeném povrchu je v elementární i oxidové formě, po ozáření se zvyšuje zastoupení oxidu. The chemical state of Na is a mixture of elemental and oxidized form and remains unchanged for all electron doses. Larger changes in the chemical form are observed for K atom. In pristine silicate glass a mixture of elemental and oxide form is observed with increasing content of oxide under irradiation. The chemical state of Na is a mixture of elemental and oxidized form and remains unchanged for all electron doses. Larger changes in the chemical form are observed for K atom. In pristine silicate glass a mixture of elemental and oxide form is observed with increasing content of oxide under irradiation.
dcterms:title
Chemický stav Na a K iontů v Na10K5 silikátovém skle ozařovaném elektrony studované pomocí XPS a analýzou tvaru linií Chemical state of Na and K ions in Na10K5 silicate glass under electron irradiation investigated by XPS with the aid of line shape analysis Chemical state of Na and K ions in Na10K5 silicate glass under electron irradiation investigated by XPS with the aid of line shape analysis
skos:prefLabel
Chemical state of Na and K ions in Na10K5 silicate glass under electron irradiation investigated by XPS with the aid of line shape analysis Chemický stav Na a K iontů v Na10K5 silikátovém skle ozařovaném elektrony studované pomocí XPS a analýzou tvaru linií Chemical state of Na and K ions in Na10K5 silicate glass under electron irradiation investigated by XPS with the aid of line shape analysis
skos:notation
RIV/68378271:_____/08:00319735!RIV09-AV0-68378271
n3:aktivita
n14:P n14:Z
n3:aktivity
P(GA104/06/0202), Z(AV0Z10100521), Z(MSM6046137302)
n3:cisloPeriodika
12
n3:dodaniDat
n6:2009
n3:domaciTvurceVysledku
n9:6323472 n9:3420868
n3:druhVysledku
n10:J
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
359723
n3:idVysledku
RIV/68378271:_____/08:00319735
n3:jazykVysledku
n5:eng
n3:klicovaSlova
Na10K5 silicate glass; electron irradiation; XPS; line shape analysis; pattern recognition
n3:klicoveSlovo
n8:line%20shape%20analysis n8:XPS n8:pattern%20recognition n8:electron%20irradiation n8:Na10K5%20silicate%20glass
n3:kodStatuVydavatele
GB - Spojené království Velké Británie a Severního Irska
n3:kontrolniKodProRIV
[8A7B939CE603]
n3:nazevZdroje
Surface and Interface Analysis
n3:obor
n16:BM
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
5
n3:projekt
n11:GA104%2F06%2F0202
n3:rokUplatneniVysledku
n6:2008
n3:svazekPeriodika
40
n3:tvurceVysledku
Lesiak, B. Zemek, Josef Jiříček, Petr Jozwik, A. Gedeon, O.
n3:wos
000261810500002
n3:zamer
n4:AV0Z10100521 n4:MSM6046137302
s:issn
0142-2421
s:numberOfPages
9