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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F08%3A00307730%21RIV08-AV0-68378271
rdf:type
skos:Concept n15:Vysledek
dcterms:description
Vodíkuprosté amorfní a nanokrystalické filmy byly připraveny magnetronovým rozprašováním Targetů SiC a Si. V závislosti na %22bias%22 a teplotě substrátů byly zkoumány jejich mechanické vlastnosti (tvrdost, modul pružnosti, vnitřní pnutí). Bylo zjištěno, že tvrdost a modul pružnosti všech amorfních a-SiC filmů byl menší než pro %22bulk%22 α-SiC monokrystalu. Částečně krystalické filmy SiC měly vyšší tvrdost a nižší modul pružnosti než α-SiC. Naproti tomu amorfní filmy Si měly všechny tvrdost a modul pružnosti nižší než Si filmy nanokrystalické, které vykázaly přibližně tytéž hodnoty jako monokrystal Si. Hydrogen-free amorphous and nanocrystalline films were prepared by magnetron sputtering of the SiC or Si targets. Mechanical properties (hardness, elastic modulus, intrinsic stress) and film structures were investigated in dependence on the substrate bias and temperature. It was found that both hardness and elastic modulus of all amorphous a-SiC films prepared at different substrate temperatures and biases are always lower than those for bulk α-SiC single crystal while the hardness of partially crystalline SiC films is higher and the elastic modulus lower than those for α-SiC one. In contrast, both hardness and elastic modulus of all amorphous Si films are always lower than those for nanocrystalline Si films which show approximately the same value as the Si single crystal. Hydrogen-free amorphous and nanocrystalline films were prepared by magnetron sputtering of the SiC or Si targets. Mechanical properties (hardness, elastic modulus, intrinsic stress) and film structures were investigated in dependence on the substrate bias and temperature. It was found that both hardness and elastic modulus of all amorphous a-SiC films prepared at different substrate temperatures and biases are always lower than those for bulk α-SiC single crystal while the hardness of partially crystalline SiC films is higher and the elastic modulus lower than those for α-SiC one. In contrast, both hardness and elastic modulus of all amorphous Si films are always lower than those for nanocrystalline Si films which show approximately the same value as the Si single crystal.
dcterms:title
Hardness and elastic modulus of amorphous and nanocrystalline SiC and Si films Hardness and elastic modulus of amorphous and nanocrystalline SiC and Si films Tvrdost a modul pružnosti amorfních a nanokrystalických filmů SiC a Si
skos:prefLabel
Hardness and elastic modulus of amorphous and nanocrystalline SiC and Si films Tvrdost a modul pružnosti amorfních a nanokrystalických filmů SiC a Si Hardness and elastic modulus of amorphous and nanocrystalline SiC and Si films
skos:notation
RIV/68378271:_____/08:00307730!RIV08-AV0-68378271
n3:strany
1738;1745
n3:aktivita
n5:Z n5:P
n3:aktivity
P(1M06002), P(OC 095), P(OC 097), Z(AV0Z10100522)
n3:cisloPeriodika
-
n3:dodaniDat
n8:2008
n3:domaciTvurceVysledku
n11:9361820 n11:5662281 n11:6658776 n11:5585457 n11:5193222 n11:3966208
n3:druhVysledku
n14:J
n3:duvernostUdaju
n9:S
n3:entitaPredkladatele
n17:predkladatel
n3:idSjednocenehoVysledku
369804
n3:idVysledku
RIV/68378271:_____/08:00307730
n3:jazykVysledku
n16:eng
n3:klicovaSlova
sputtering; hardness; nanocrystalline SiC films; nanocomposites; amorphous
n3:klicoveSlovo
n6:sputtering n6:hardness n6:nanocrystalline%20SiC%20films n6:amorphous n6:nanocomposites
n3:kodStatuVydavatele
CH - Švýcarská konfederace
n3:kontrolniKodProRIV
[35C429E7CF45]
n3:nazevZdroje
Surface and Coatings Technology
n3:obor
n18:BM
n3:pocetDomacichTvurcuVysledku
6
n3:pocetTvurcuVysledku
7
n3:projekt
n4:1M06002 n4:OC%20097 n4:OC%20095
n3:rokUplatneniVysledku
n8:2008
n3:svazekPeriodika
202
n3:tvurceVysledku
Vorlíček, Vladimír Boháč, Petr Čtvrtlík, Radim Stranyánek, Martin Kurdyumov, A. Kulykovskyy, Valeriy Jastrabík, Lubomír
n3:zamer
n13:AV0Z10100522
s:issn
0257-8972
s:numberOfPages
8