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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F07%3A00086725%21RIV08-AV0-68378271
rdf:type
n4:Vysledek skos:Concept
dcterms:description
Titan-karbonitridové vrstvy byly připraveny hybridním depozičním systémem kombinujícím DC magnetron a KrF laser. Vrstvy byly připraveny za pokojové teploty a v dusíkovém okolí při hustotě laserové energie 15 Jcm-2 a výkonu magnetronu 150 W. Vrstvy byly charakterizovány metodami XRD, GDOES a XPS. Titanium carbonitride thin films were prepared by hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition. Carbon and titanium species were simultaneously deposited on the same rotated Si substrate. Films were fabricated at room substrate temperature in argon-nitrogen ambient atmosphere, for laser fluence of 15 J.cm-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Films were studied by XRD and glow discharge optical emission spectroscopy (GDOES). Mechanical and electronic properties (XPS) were also measured. Titanium carbonitride thin films were prepared by hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition. Carbon and titanium species were simultaneously deposited on the same rotated Si substrate. Films were fabricated at room substrate temperature in argon-nitrogen ambient atmosphere, for laser fluence of 15 J.cm-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Films were studied by XRD and glow discharge optical emission spectroscopy (GDOES). Mechanical and electronic properties (XPS) were also measured.
dcterms:title
Tenké vrstvy TiCN připravené hybridní magnetron- laserovou depozicí Thin TiCN films prepared by hybrid magnetron-laser deposition Thin TiCN films prepared by hybrid magnetron-laser deposition
skos:prefLabel
Tenké vrstvy TiCN připravené hybridní magnetron- laserovou depozicí Thin TiCN films prepared by hybrid magnetron-laser deposition Thin TiCN films prepared by hybrid magnetron-laser deposition
skos:notation
RIV/68378271:_____/07:00086725!RIV08-AV0-68378271
n3:strany
5651;5654
n3:aktivita
n13:P n13:Z
n3:aktivity
P(GA202/06/0216), Z(AV0Z10100522)
n3:cisloPeriodika
-
n3:dodaniDat
n11:2008
n3:domaciTvurceVysledku
n14:7895712 n14:1722247
n3:druhVysledku
n7:J
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
455115
n3:idVysledku
RIV/68378271:_____/07:00086725
n3:jazykVysledku
n9:eng
n3:klicovaSlova
laser deposition; magnetron; radio frequency discharge; thin films; TiCN
n3:klicoveSlovo
n8:laser%20deposition n8:TiCN n8:magnetron n8:radio%20frequency%20discharge n8:thin%20films
n3:kodStatuVydavatele
DE - Spolková republika Německo
n3:kontrolniKodProRIV
[3D8F8656AFF2]
n3:nazevZdroje
Plasma Processes and Polymers
n3:obor
n17:BH
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
5
n3:projekt
n12:GA202%2F06%2F0216
n3:rokUplatneniVysledku
n11:2007
n3:svazekPeriodika
4
n3:tvurceVysledku
Kadlec, J. Santoni, A. Kocourek, Tomáš Jelínek, Miroslav Popov, C.
n3:zamer
n16:AV0Z10100522
s:issn
1612-8850
s:numberOfPages
4