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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F07%3A00086335%21RIV08-AV0-68378271
rdf:type
n8:Vysledek skos:Concept
dcterms:description
High-surface-quality amorphous carbon (a-C) optical coatings with a thickness of 45 nm, deposited by magnetron sputtering on a silicon substrate were irradiated by the focused beam of capillary-discharge Ne-like Ar XUV laser (CDL). Investigating consequences of the multiple-shot exposure it has been found that an accumulation of 10, 20 and 40 shots at a fluence of 0.5 J/cm2, i.e., below the single-shot damage threshold, causes irreversible changes of a-C thin layer which can be registered by both the AFM and the DIC microscopy Amorfní uhlíková (a-C) optická pokrytí vysoké kvality tloušťky 45 nm deponovaná magnetronovým naprašováním na křemíkových substrátech byla ozářena fokusovaným svazkem kapilárním výbojovým XUV laserem. Zjistili jsme, že expozice 10, 20 a 40 pulzy vedla k poškození povrchu při fluenci 0.5 J/cm2, tedy bezpečně pod prahem poškození jedním impulzem High-surface-quality amorphous carbon (a-C) optical coatings with a thickness of 45 nm, deposited by magnetron sputtering on a silicon substrate were irradiated by the focused beam of capillary-discharge Ne-like Ar XUV laser (CDL). Investigating consequences of the multiple-shot exposure it has been found that an accumulation of 10, 20 and 40 shots at a fluence of 0.5 J/cm2, i.e., below the single-shot damage threshold, causes irreversible changes of a-C thin layer which can be registered by both the AFM and the DIC microscopy
dcterms:title
Poškození amorfního uhlíku zářením XUV laseru (46,9 nm) mnoha pulzy pod prahem poškození jedním impulzem Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold
skos:prefLabel
Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold Poškození amorfního uhlíku zářením XUV laseru (46,9 nm) mnoha pulzy pod prahem poškození jedním impulzem Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold
skos:notation
RIV/68378271:_____/07:00086335!RIV08-AV0-68378271
n3:strany
1;7
n3:aktivita
n20:Z n20:P
n3:aktivity
P(1P04LA235), P(IAA400100701), P(KAN300100702), P(LC510), P(LC528), Z(AV0Z10100523)
n3:dodaniDat
n11:2008
n3:domaciTvurceVysledku
n10:2712679 n10:6173047 n10:8434050 n10:5662281
n3:druhVysledku
n15:D
n3:duvernostUdaju
n18:S
n3:entitaPredkladatele
n17:predkladatel
n3:idSjednocenehoVysledku
412609
n3:idVysledku
RIV/68378271:_____/07:00086335
n3:jazykVysledku
n13:eng
n3:klicovaSlova
radiation damage; amorphous carbon; XUV radiation; capillary-discharge laser
n3:klicoveSlovo
n9:radiation%20damage n9:capillary-discharge%20laser n9:XUV%20radiation n9:amorphous%20carbon
n3:kontrolniKodProRIV
[1610FAB7BFD8]
n3:mistoKonaniAkce
Prague
n3:mistoVydani
Bellingham
n3:nazevZdroje
Damage to VUV, EUV, and X-ray Optics
n3:obor
n4:BH
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
8
n3:projekt
n5:KAN300100702 n5:LC528 n5:1P04LA235 n5:LC510 n5:IAA400100701
n3:rokUplatneniVysledku
n11:2007
n3:tvurceVysledku
Vorlíček, Vladimír Chalupský, Jaromír Ritucci, A. Störmer, M. Reale, A. Hájková, Věra Juha, Libor Zuppella, P.
n3:typAkce
n19:WRD
n3:zahajeniAkce
2007-04-18+02:00
n3:zamer
n21:AV0Z10100523
s:numberOfPages
7
n14:hasPublisher
SPIE
n6:isbn
978-0-8194-6714-0