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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F06%3A00039940%21RIV07-AV0-68378271
rdf:type
n11:Vysledek skos:Concept
dcterms:description
Titanium carbide films were grown using a magnetron assisted pulse laser deposition combining KrF pulsed laser deposition and DC magnetron sputtering (PLDMS). Plasma streams produced by magnetron and laser ablation were intersected on the substrate surface. Films properties were characterized by GDOES, AFM, XRD, XPS as well as by Raman spectroscopy. The adhesiojn and microhardness were also studied. Crystalline TiC films were fabricated at room temperature Titanium carbide films were grown using a magnetron assisted pulse laser deposition combining KrF pulsed laser deposition and DC magnetron sputtering (PLDMS). Plasma streams produced by magnetron and laser ablation were intersected on the substrate surface. Films properties were characterized by GDOES, AFM, XRD, XPS as well as by Raman spectroscopy. The adhesiojn and microhardness were also studied. Crystalline TiC films were fabricated at room temperature TiC crystvy byly vytvářeny kombinací magnetronového napařování a laserové deposice. Vlastnosti vrystev byly charakterizovány metodami GDOES, AFM, XRD, XPS a Ramanovskou spektroskopii. Byla studována adheze a mikrotvrdost. Vrstvy TiC byly připraveny za pokojové teploty podložky
dcterms:title
KrF laser deposition combined with magnetron sputtering to grow titanium-carbide layers KrF laser deposition combined with magnetron sputtering to grow titanium-carbide layers KrF laserová depozice kombinovaná s magnetronem pro růst TiC vrystev
skos:prefLabel
KrF laser deposition combined with magnetron sputtering to grow titanium-carbide layers KrF laserová depozice kombinovaná s magnetronem pro růst TiC vrystev KrF laser deposition combined with magnetron sputtering to grow titanium-carbide layers
skos:notation
RIV/68378271:_____/06:00039940!RIV07-AV0-68378271
n3:strany
101;105
n3:aktivita
n16:Z n16:P
n3:aktivity
P(IAA1010110), P(LN00A015), Z(AV0Z1010914)
n3:cisloPeriodika
-
n3:dodaniDat
n8:2007
n3:domaciTvurceVysledku
n6:5662281 n6:1722247 n6:7895712 n6:5585457 n6:5799015 n6:8183201
n3:druhVysledku
n18:J
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n13:predkladatel
n3:idSjednocenehoVysledku
482482
n3:idVysledku
RIV/68378271:_____/06:00039940
n3:jazykVysledku
n17:eng
n3:klicovaSlova
PLD; magnetron sputtering; hybrid deposition; TiC film
n3:klicoveSlovo
n4:magnetron%20sputtering n4:TiC%20film n4:hybrid%20deposition n4:PLD
n3:kodStatuVydavatele
CH - Švýcarská konfederace
n3:kontrolniKodProRIV
[5C852FB3A1EC]
n3:nazevZdroje
Thin Solid Films
n3:obor
n14:BM
n3:pocetDomacichTvurcuVysledku
6
n3:pocetTvurcuVysledku
9
n3:projekt
n12:IAA1010110 n12:LN00A015
n3:rokUplatneniVysledku
n8:2006
n3:svazekPeriodika
506-507
n3:tvurceVysledku
Boháč, Petr Kocourek, Tomáš Jelínek, Miroslav Studnička, Václav Uherek, F. Santoni, A. Čerňanský, Marian Vorlíček, Vladimír Kadlec, J.
n3:zamer
n10:AV0Z1010914
s:issn
0040-6090
s:numberOfPages
5