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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F05%3A00041223%21RIV07-AV0-68378271
rdf:type
skos:Concept n19:Vysledek
dcterms:description
Titanium-carbonitride thin films were grown at room temperature using a hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition (MSPLD). Carbon and titanium were simultaneously deposited an the same Si substrate dimensions of 3 x 3 cm. Films were fabricated in argon-nitrogen atmosphere of 1 Pa - 5 Pa, for laser fluence of Jcm-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Film crystallinity was studied by XRD and the composition depth profile of TiCN layers by glow discharge optical emission spectroscopy (GDOES). Titan-karbonitridové tenké vrstvy byly deponovány při pokojové teplotě hybridní depozicí kombinující DC magnetron a KrF laserovou depozici. Bylo deponováno v dusíkové atmosféře 1 Pa - 5 Pa, hustota laserové energie 15 Jcm-2 a výkon magnetronu 150 W. Bylo studováno složení vrstvy a XRD. Titanium-carbonitride thin films were grown at room temperature using a hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition (MSPLD). Carbon and titanium were simultaneously deposited an the same Si substrate dimensions of 3 x 3 cm. Films were fabricated in argon-nitrogen atmosphere of 1 Pa - 5 Pa, for laser fluence of Jcm-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Film crystallinity was studied by XRD and the composition depth profile of TiCN layers by glow discharge optical emission spectroscopy (GDOES).
dcterms:title
Studie tenkých TiCxN1-x vrstev vyrobených hybridní magnetron-laserovou depozicí Study of thin TiCxN1-x films fabricated by hybrid magnetron-laser deposition Study of thin TiCxN1-x films fabricated by hybrid magnetron-laser deposition
skos:prefLabel
Study of thin TiCxN1-x films fabricated by hybrid magnetron-laser deposition Study of thin TiCxN1-x films fabricated by hybrid magnetron-laser deposition Studie tenkých TiCxN1-x vrstev vyrobených hybridní magnetron-laserovou depozicí
skos:notation
RIV/68378271:_____/05:00041223!RIV07-AV0-68378271
n5:strany
61800G/1;61800G/5
n5:aktivita
n6:Z n6:P
n5:aktivity
P(IAA1010110), Z(AV0Z10100522)
n5:dodaniDat
n15:2007
n5:domaciTvurceVysledku
n11:5799015 n11:1722247 n11:7895712
n5:druhVysledku
n17:D
n5:duvernostUdaju
n10:S
n5:entitaPredkladatele
n12:predkladatel
n5:idSjednocenehoVysledku
545296
n5:idVysledku
RIV/68378271:_____/05:00041223
n5:jazykVysledku
n20:eng
n5:klicovaSlova
laser deposition; magnetron; radiofrequency discharge; TiCN; thin films
n5:klicoveSlovo
n8:radiofrequency%20discharge n8:thin%20films n8:laser%20deposition n8:magnetron n8:TiCN
n5:kontrolniKodProRIV
[1532EEC4AB55]
n5:mistoKonaniAkce
Prague
n5:mistoVydani
Bellingham
n5:nazevZdroje
Proceeding of SPIE - Int. Connference on Lasers, Applications, and Technologies 2005. Laser-Assisted Micro- and Nanotechnologies
n5:obor
n14:BH
n5:pocetDomacichTvurcuVysledku
3
n5:pocetTvurcuVysledku
4
n5:projekt
n18:IAA1010110
n5:rokUplatneniVysledku
n15:2005
n5:tvurceVysledku
Studnička, Václav Kadlec, J. Jelínek, Miroslav Kocourek, Tomáš
n5:typAkce
n21:WRD
n5:zahajeniAkce
2005-06-08+02:00
n5:zamer
n9:AV0Z10100522
s:numberOfPages
5
n3:hasPublisher
SPIE
n13:isbn
0-8194-6213-6