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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F00%3A02010098%21RIV%2F2003%2FAV0%2FA02003%2FN
rdf:type
skos:Concept n16:Vysledek
dcterms:description
Hydrogenated carbon nitride and carbon nitride films were deposited by ECR plasma-assisted CVD and rf reactive magnetron sputtering. Film composition(N/C ratio), growth rate (Vg) and microhardness bias in the range 0 to 200V. As was revealed, the ion bombardment influences the composition and growth rate of carbon nitride films during their deposition. Hydrogenated carbon nitride and carbon nitride films were deposited by ECR plasma-assisted CVD and rf reactive magnetron sputtering. Film composition(N/C ratio), growth rate (Vg) and microhardness bias in the range 0 to 200V. As was revealed, the ion bombardment influences the composition and growth rate of carbon nitride films during their deposition.
dcterms:title
Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering. Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering.
skos:prefLabel
Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering. Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering.
skos:notation
RIV/68378271:_____/00:02010098!RIV/2003/AV0/A02003/N
n3:strany
261;267
n3:aktivita
n9:Z n9:P
n3:aktivity
P(IAA1010827), P(IPP1010912), Z(AV0Z1010914)
n3:cisloPeriodika
N/A
n3:dodaniDat
n8:2003
n3:domaciTvurceVysledku
n4:5193222 n4:6321445
n3:druhVysledku
n11:J
n3:duvernostUdaju
n6:S
n3:entitaPredkladatele
n15:predkladatel
n3:idSjednocenehoVysledku
708251
n3:idVysledku
RIV/68378271:_____/00:02010098
n3:jazykVysledku
n13:eng
n3:klicovaSlova
N/A
n3:klicoveSlovo
n17:N%2FA
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[754DE55DFA9F]
n3:nazevZdroje
Surface and Coatings Technology
n3:obor
n5:BM
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
4
n3:pocetUcastnikuAkce
0
n3:pocetZahranicnichUcastnikuAkce
0
n3:projekt
n10:IPP1010912 n10:IAA1010827
n3:rokUplatneniVysledku
n8:2000
n3:svazekPeriodika
123
n3:tvurceVysledku
Soukup, Ladislav Jastrabík, Lubomír Onoprienko, A. A. Shaginyan, L. R.
n3:zamer
n18:AV0Z1010914
s:issn
0257-8972
s:numberOfPages
7