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Statements

Subject Item
n2:RIV%2F68081731%3A_____%2F12%3A00390976%21RIV13-AV0-68081731
rdf:type
n9:Vysledek skos:Concept
dcterms:description
Recent developments in nanotechnologies raised new issues in microscopy with nanometer and sub nanometer resolution. Together with the imaging techniques, new approaches in the metrology field are required both in the direct metrology issues and in the area of calibration of the imaging tools (microscopes). Scanning electron microscopy needs the calibration specimens for adjusting the size of the view field (correct magnification) and the shape of that field (correction of deflection field distortions). Calibration specimens have been prepared using different technologies; among them the e–beam patterning and the e–beam lithography have been proved to be appropriate and flexible tool for that task. In the past, we have reported several times our achievements in this field (e.g. [1]). Nevertheless, recent advances of the patterning tool (BS600), mainly the development of the technology zoomed exposure mode [2] and the installation of the magnetic field active cancellation system [3], pushed remarkably the technology necessary for further advances in this area. Within this contribution some theoretical, technology and practical aspects are discussed; achieved results are presented. Recent developments in nanotechnologies raised new issues in microscopy with nanometer and sub nanometer resolution. Together with the imaging techniques, new approaches in the metrology field are required both in the direct metrology issues and in the area of calibration of the imaging tools (microscopes). Scanning electron microscopy needs the calibration specimens for adjusting the size of the view field (correct magnification) and the shape of that field (correction of deflection field distortions). Calibration specimens have been prepared using different technologies; among them the e–beam patterning and the e–beam lithography have been proved to be appropriate and flexible tool for that task. In the past, we have reported several times our achievements in this field (e.g. [1]). Nevertheless, recent advances of the patterning tool (BS600), mainly the development of the technology zoomed exposure mode [2] and the installation of the magnetic field active cancellation system [3], pushed remarkably the technology necessary for further advances in this area. Within this contribution some theoretical, technology and practical aspects are discussed; achieved results are presented.
dcterms:title
Calibration specimens for microscopy Calibration specimens for microscopy
skos:prefLabel
Calibration specimens for microscopy Calibration specimens for microscopy
skos:notation
RIV/68081731:_____/12:00390976!RIV13-AV0-68081731
n9:predkladatel
n11:ico%3A68081731
n3:aktivita
n7:I n7:P
n3:aktivity
I, P(ED0017/01/01), P(FR-TI1/576), P(TE01020233)
n3:dodaniDat
n8:2013
n3:domaciTvurceVysledku
n5:1259458 n5:1619217 n5:9640282 n5:5892457 n5:8423350 n5:3455599 n5:5422043 n5:4182170
n3:druhVysledku
n20:D
n3:duvernostUdaju
n12:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
125845
n3:idVysledku
RIV/68081731:_____/12:00390976
n3:jazykVysledku
n19:eng
n3:klicovaSlova
E-beam technology; calibration specimen; scanning electron microscopy
n3:klicoveSlovo
n10:E-beam%20technology n10:scanning%20electron%20microscopy n10:calibration%20specimen
n3:kontrolniKodProRIV
[583C141DC488]
n3:mistoKonaniAkce
Brno
n3:mistoVydani
Ostrava
n3:nazevZdroje
NANOCON 2012, 4th International Conference Proceedings
n3:obor
n14:JA
n3:pocetDomacichTvurcuVysledku
8
n3:pocetTvurcuVysledku
8
n3:projekt
n13:ED0017%2F01%2F01 n13:FR-TI1%2F576 n13:TE01020233
n3:rokUplatneniVysledku
n8:2012
n3:tvurceVysledku
Urbánek, Michal Kolařík, Vladimír Matějka, František Král, Stanislav Krátký, Stanislav Horáček, Miroslav Bok, Jan Matějka, Milan
n3:typAkce
n21:WRD
n3:zahajeniAkce
2012-10-23+02:00
s:numberOfPages
4
n16:hasPublisher
TANGER Ltd
n17:isbn
978-80-87294-32-1