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Statements

Subject Item
n2:RIV%2F68081731%3A_____%2F12%3A00386400%21RIV13-AV0-68081731
rdf:type
skos:Concept n15:Vysledek
dcterms:description
Electron Beam Writer (EBW) is a lithographic tool allowing generation of patterns in high resolution. The writing is carried out into a layer of a sensitive material (resist), which is deposited on the substrate surface (e.g. silicon). The resolution of the EBW is limited not only by the beam spot size, but also by the electron scattering effects (forward scattering, backscattering). Thus, even if the beam spot size on the resist surface is very small, due to electron scattering effect in the resist, the exposed area is significantly broader than the original beam spot size [1, 2]. Electron Beam Writer (EBW) is a lithographic tool allowing generation of patterns in high resolution. The writing is carried out into a layer of a sensitive material (resist), which is deposited on the substrate surface (e.g. silicon). The resolution of the EBW is limited not only by the beam spot size, but also by the electron scattering effects (forward scattering, backscattering). Thus, even if the beam spot size on the resist surface is very small, due to electron scattering effect in the resist, the exposed area is significantly broader than the original beam spot size [1, 2].
dcterms:title
Proximity effect simulation for variable shape e-beam writer Proximity effect simulation for variable shape e-beam writer
skos:prefLabel
Proximity effect simulation for variable shape e-beam writer Proximity effect simulation for variable shape e-beam writer
skos:notation
RIV/68081731:_____/12:00386400!RIV13-AV0-68081731
n15:predkladatel
n18:ico%3A68081731
n3:aktivita
n21:P n21:I
n3:aktivity
I, P(ED0017/01/01), P(FR-TI1/576)
n3:dodaniDat
n13:2013
n3:domaciTvurceVysledku
n10:5422043 n10:8423350 n10:1619217 n10:9640282 n10:3455599
n3:druhVysledku
n8:D
n3:duvernostUdaju
n19:S
n3:entitaPredkladatele
n14:predkladatel
n3:idSjednocenehoVysledku
163250
n3:idVysledku
RIV/68081731:_____/12:00386400
n3:jazykVysledku
n7:eng
n3:klicovaSlova
electron scattering effects; e-beam writer; computer simulation
n3:klicoveSlovo
n6:e-beam%20writer n6:electron%20scattering%20effects n6:computer%20simulation
n3:kontrolniKodProRIV
[6F23FAEE0E69]
n3:mistoKonaniAkce
Skalský dvůr
n3:mistoVydani
Brno
n3:nazevZdroje
Proceedings of the 13th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation
n3:obor
n11:JA
n3:pocetDomacichTvurcuVysledku
5
n3:pocetTvurcuVysledku
7
n3:projekt
n9:FR-TI1%2F576 n9:ED0017%2F01%2F01
n3:rokUplatneniVysledku
n13:2012
n3:tvurceVysledku
Matějka, Milan Král, Stanislav Krátký, Stanislav Mikšík, P. Urbánek, Michal Vašina, J. Kolařík, Vladimír
n3:typAkce
n5:WRD
n3:zahajeniAkce
2012-06-25+02:00
s:numberOfPages
2
n12:hasPublisher
Institute of Scientific Instruments AS CR, v.v.i
n20:isbn
978-80-87441-07-7