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Statements

Subject Item
n2:RIV%2F68081731%3A_____%2F11%3A00365942%21RIV12-MSM-68081731
rdf:type
n13:Vysledek skos:Concept
dcterms:description
The surface morphology of pure Mg was studied by means of the cathode lens mode equipped scanning low energy electron microscope after bombarding with Ga(+) ions at various energies (10, 20, 30, and 40 keV) and incident angles (0 degrees, 30 degrees, 45 degrees, and 60 degrees). In accordance with the Bradley-Harper theory at off-normal angles of incidence ripples were observed on the irradiated areas. The Monte Carlo program SRIM2008 was used to estimate the sputtering yield and damage depth. The surface morphology of pure Mg was studied by means of the cathode lens mode equipped scanning low energy electron microscope after bombarding with Ga(+) ions at various energies (10, 20, 30, and 40 keV) and incident angles (0 degrees, 30 degrees, 45 degrees, and 60 degrees). In accordance with the Bradley-Harper theory at off-normal angles of incidence ripples were observed on the irradiated areas. The Monte Carlo program SRIM2008 was used to estimate the sputtering yield and damage depth.
dcterms:title
FIB Induced Damage Examined with the Low Energy SEM FIB Induced Damage Examined with the Low Energy SEM
skos:prefLabel
FIB Induced Damage Examined with the Low Energy SEM FIB Induced Damage Examined with the Low Energy SEM
skos:notation
RIV/68081731:_____/11:00365942!RIV12-MSM-68081731
n13:predkladatel
n17:ico%3A68081731
n3:aktivita
n12:P n12:Z
n3:aktivity
P(OE08012), Z(AV0Z20650511)
n3:cisloPeriodika
3
n3:dodaniDat
n14:2012
n3:domaciTvurceVysledku
n7:9000984 n7:7708017 n7:6440959
n3:druhVysledku
n10:J
n3:duvernostUdaju
n18:S
n3:entitaPredkladatele
n11:predkladatel
n3:idSjednocenehoVysledku
199571
n3:idVysledku
RIV/68081731:_____/11:00365942
n3:jazykVysledku
n6:eng
n3:klicovaSlova
scanning low energy electron microscopy; focused ion beam; beam induced damage; sputtering
n3:klicoveSlovo
n8:beam%20induced%20damage n8:scanning%20low%20energy%20electron%20microscopy n8:sputtering n8:focused%20ion%20beam
n3:kodStatuVydavatele
JP - Japonsko
n3:kontrolniKodProRIV
[EEAB6ED09D8A]
n3:nazevZdroje
Materials Transactions
n3:obor
n16:JA
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
6
n3:projekt
n20:OE08012
n3:rokUplatneniVysledku
n14:2011
n3:svazekPeriodika
52
n3:tvurceVysledku
Frank, Luděk Ikeno, S. Watanabe, K. Matsuda, K. Mikmeková, Šárka Müllerová, Ilona
n3:wos
000290461000006
n3:zamer
n15:AV0Z20650511
s:issn
1345-9678
s:numberOfPages
5
n19:doi
10.2320/matertrans.MB201005