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Statements

Subject Item
n2:RIV%2F68081731%3A_____%2F11%3A00365941%21RIV12-AV0-68081731
rdf:type
n10:Vysledek skos:Concept
dcterms:description
Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 degrees C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO(2) films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the film optical constants are expressed using a recently developed parametrized joint density of states model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail. Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 degrees C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO(2) films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the film optical constants are expressed using a recently developed parametrized joint density of states model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail.
dcterms:title
Optical characterization of HfO(2) thin films Optical characterization of HfO(2) thin films
skos:prefLabel
Optical characterization of HfO(2) thin films Optical characterization of HfO(2) thin films
skos:notation
RIV/68081731:_____/11:00365941!RIV12-AV0-68081731
n10:predkladatel
n12:ico%3A68081731
n3:aktivita
n14:I n14:Z
n3:aktivity
I, Z(AV0Z20650511), Z(MSM0021622411)
n3:cisloPeriodika
18
n3:dodaniDat
n5:2012
n3:domaciTvurceVysledku
n16:5000165
n3:druhVysledku
n15:J
n3:duvernostUdaju
n17:S
n3:entitaPredkladatele
n8:predkladatel
n3:idSjednocenehoVysledku
218529
n3:idVysledku
RIV/68081731:_____/11:00365941
n3:jazykVysledku
n13:eng
n3:klicovaSlova
optical properties; ellipsometry; spectrophotometry; hafnium oxide; transition-metal oxide; Urbach tail
n3:klicoveSlovo
n4:spectrophotometry n4:hafnium%20oxide n4:Urbach%20tail n4:transition-metal%20oxide n4:optical%20properties n4:ellipsometry
n3:kodStatuVydavatele
CH - Švýcarská konfederace
n3:kontrolniKodProRIV
[93F36677BA98]
n3:nazevZdroje
Thin Solid Films
n3:obor
n11:JK
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
7
n3:rokUplatneniVysledku
n5:2011
n3:svazekPeriodika
519
n3:tvurceVysledku
Franta, D. Nečas, D. Caha, O. Vižďa, F. Hasoň, M. Ohlídal, I. Pokorný, Pavel
n3:wos
000292576500042
n3:zamer
n9:AV0Z20650511 n9:MSM0021622411
s:issn
0040-6090
s:numberOfPages
7
n19:doi
10.1016/j.tsf.2011.03.128