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Statements

Subject Item
n2:RIV%2F67985882%3A_____%2F08%3A00358922%21RIV11-MSM-67985882
rdf:type
skos:Concept n18:Vysledek
dcterms:description
Unexpectedly large yields of positive and negative ions are produced when 2 and 5 keV Si+ is singly scattered from Cs adatoms on Al(100) and Si(111).This is in contrast with Li+, in which case the ions are almost completely neutralized. The Si+ ions likely result from valence electron resonant transfer (RCT) enhanced by promotion of the ionization level as it interacts with the Cs 2p level. Unexpectedly large yields of positive and negative ions are produced when 2 and 5 keV Si+ is singly scattered from Cs adatoms on Al(100) and Si(111).This is in contrast with Li+, in which case the ions are almost completely neutralized. The Si+ ions likely result from valence electron resonant transfer (RCT) enhanced by promotion of the ionization level as it interacts with the Cs 2p level.
dcterms:title
Charge exchange between low energy Si ions and Cs adatoms Charge exchange between low energy Si ions and Cs adatoms
skos:prefLabel
Charge exchange between low energy Si ions and Cs adatoms Charge exchange between low energy Si ions and Cs adatoms
skos:notation
RIV/67985882:_____/08:00358922!RIV11-MSM-67985882
n3:aktivita
n12:Z n12:P
n3:aktivity
P(IAA1067401), P(MEB060715), Z(AV0Z20670512)
n3:cisloPeriodika
2
n3:dodaniDat
n10:2011
n3:domaciTvurceVysledku
n17:4692195
n3:druhVysledku
n13:J
n3:duvernostUdaju
n6:S
n3:entitaPredkladatele
n5:predkladatel
n3:idSjednocenehoVysledku
359676
n3:idVysledku
RIV/67985882:_____/08:00358922
n3:jazykVysledku
n15:eng
n3:klicovaSlova
ion-surface impact; scattering; silicon; alkali metals
n3:klicoveSlovo
n4:scattering n4:alkali%20metals n4:ion-surface%20impact n4:silicon
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[9E2DB147F6A1]
n3:nazevZdroje
Surface Science
n3:obor
n14:BM
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
3
n3:projekt
n7:MEB060715 n7:IAA1067401
n3:rokUplatneniVysledku
n10:2008
n3:svazekPeriodika
602
n3:tvurceVysledku
Šroubek, Zdeněk Yarmoff, J. A. Chen, X.
n3:wos
000253277900032
n3:zamer
n9:AV0Z20670512
s:issn
0039-6028
s:numberOfPages
10