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Statements

Subject Item
n2:RIV%2F61389013%3A_____%2F04%3A00105694%21RIV%2F2005%2FMSM%2FA55005%2FN
rdf:type
skos:Concept n18:Vysledek
dcterms:description
Oxidative changes in poly[methyl(phenyl)silanediyl] films exposed in a Weather-O-Meter ATLAS Ci 3000+ were monitored by Fourier transform infrared spectroscopy. Increases in absorption in the siloxane, carbonyl, and hydroxyl regions, decreases in absorption in the Si-Si region, and changes in the aromatic C-H bond region were monitored. Oxidační změny poly[methyl(fenyl)silanediylových] filmů exponovaných ve Weatherometeru ATLAS Ci 3000+ byly sledovány Fourierovskou infračervenou spektroskopií. Byla sledována zvýšená absorpce v oblasti siloxanové, karbonylové a hydroxylové a pokles absorpce v oblasti vazeb Si-Si a změny v oblasti aromatických vazeb C-H. Oxidative changes in poly[methyl(phenyl)silanediyl] films exposed in a Weather-O-Meter ATLAS Ci 3000+ were monitored by Fourier transform infrared spectroscopy. Increases in absorption in the siloxane, carbonyl, and hydroxyl regions, decreases in absorption in the Si-Si region, and changes in the aromatic C-H bond region were monitored.
dcterms:title
Phototriggered atmospheric degradation of poly[methyl(phenyl)silanediyl] in the presence of ultraviolet absorbers Fotochemicky iniciovaná atmosférická degradace poly[methyl(fenyl)silanediylu] za přítomnosti absorbérů UV záření Phototriggered atmospheric degradation of poly[methyl(phenyl)silanediyl] in the presence of ultraviolet absorbers
skos:prefLabel
Fotochemicky iniciovaná atmosférická degradace poly[methyl(fenyl)silanediylu] za přítomnosti absorbérů UV záření Phototriggered atmospheric degradation of poly[methyl(phenyl)silanediyl] in the presence of ultraviolet absorbers Phototriggered atmospheric degradation of poly[methyl(phenyl)silanediyl] in the presence of ultraviolet absorbers
skos:notation
RIV/61389013:_____/04:00105694!RIV/2005/MSM/A55005/N
n3:strany
714;721
n3:aktivita
n17:Z n17:P
n3:aktivity
P(ME 543), Z(AV0Z4050913), Z(MSM 113200001)
n3:cisloPeriodika
3
n3:dodaniDat
n9:2005
n3:domaciTvurceVysledku
n14:8481954 n14:1763709 n14:5801737 n14:1460021
n3:druhVysledku
n7:J
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n16:predkladatel
n3:idSjednocenehoVysledku
579465
n3:idVysledku
RIV/61389013:_____/04:00105694
n3:jazykVysledku
n11:eng
n3:klicovaSlova
polysilanes;irreversible degradation;photooxidation
n3:klicoveSlovo
n4:polysilanes n4:irreversible%20degradation n4:photooxidation
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[FBBB2BB76694]
n3:nazevZdroje
Journal of Polymer Science Part A: Polymer Chemistry
n3:obor
n8:CD
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
4
n3:projekt
n13:ME%20543
n3:rokUplatneniVysledku
n9:2004
n3:svazekPeriodika
42
n3:tvurceVysledku
Nešpůrek, Stanislav Pospíšil, Jan Meszároš, Oto Schmidt, Pavel
n3:zamer
n6:MSM%20113200001 n6:AV0Z4050913
s:issn
0887-624X
s:numberOfPages
8