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Statements

Subject Item
n2:RIV%2F61389005%3A_____%2F11%3A00435939%21RIV15-AV0-61389005
rdf:type
skos:Concept n8:Vysledek
dcterms:description
Nanostructured nickel oxide layers (thickness cca 100 nm) were prepared by bombardment of nickel foil with ion beam created from a mixture of argon and oxygen. Different volume ratios of argon:oxygen mixture were used, ranging from 4:1 to 1:3. Composition of the resulting layers was analyzed by RBS, morphology by AFM and main crystal orientation of the sample by XRD. The electrophysical properties (resistivity, concentration of charge carriers) were measured by four point Van der Pauw technique and Hall measurement respectively. Prepared samples were characterized in as-deposited state and after annealing with varying temperature of treatment. Chemical composition (i.e. stoichiometry) of the as-deposited samples with different argon: oxygen ratio was related to their electrophysical parameters. Hall measurements are showing majority charge carriers to be electrons - surface concentration (0.5 - 2.3) x 10(21) m(-2) - suggesting prevailing metallic conductivity. Resistivity of the sample is increasing with higher amount of oxygen in gas mixture. The as-deposited layer is almost amorphous with no visible grains on AFM. Nanostructured nickel oxide layers (thickness cca 100 nm) were prepared by bombardment of nickel foil with ion beam created from a mixture of argon and oxygen. Different volume ratios of argon:oxygen mixture were used, ranging from 4:1 to 1:3. Composition of the resulting layers was analyzed by RBS, morphology by AFM and main crystal orientation of the sample by XRD. The electrophysical properties (resistivity, concentration of charge carriers) were measured by four point Van der Pauw technique and Hall measurement respectively. Prepared samples were characterized in as-deposited state and after annealing with varying temperature of treatment. Chemical composition (i.e. stoichiometry) of the as-deposited samples with different argon: oxygen ratio was related to their electrophysical parameters. Hall measurements are showing majority charge carriers to be electrons - surface concentration (0.5 - 2.3) x 10(21) m(-2) - suggesting prevailing metallic conductivity. Resistivity of the sample is increasing with higher amount of oxygen in gas mixture. The as-deposited layer is almost amorphous with no visible grains on AFM.
dcterms:title
Characterization of the Nanostructured Nickel Oxide Layers Prepared by Ion Beam Sputtering Characterization of the Nanostructured Nickel Oxide Layers Prepared by Ion Beam Sputtering
skos:prefLabel
Characterization of the Nanostructured Nickel Oxide Layers Prepared by Ion Beam Sputtering Characterization of the Nanostructured Nickel Oxide Layers Prepared by Ion Beam Sputtering
skos:notation
RIV/61389005:_____/11:00435939!RIV15-AV0-61389005
n3:aktivita
n6:I
n3:aktivity
I
n3:dodaniDat
n7:2015
n3:domaciTvurceVysledku
n12:7639015 n12:1911325 n12:7569033
n3:druhVysledku
n17:D
n3:duvernostUdaju
n9:S
n3:entitaPredkladatele
n15:predkladatel
n3:idSjednocenehoVysledku
190002
n3:idVysledku
RIV/61389005:_____/11:00435939
n3:jazykVysledku
n18:eng
n3:klicovaSlova
Nickel oxide; Ion Beam Sputtering; Van der Pauw
n3:klicoveSlovo
n10:Nickel%20oxide n10:Van%20der%20Pauw n10:Ion%20Beam%20Sputtering
n3:kontrolniKodProRIV
[B45D1F4F2728]
n3:mistoKonaniAkce
Brno
n3:mistoVydani
Brno
n3:nazevZdroje
NANOCON 2011, Conference Proceedings, 3 rd International Conference
n3:obor
n5:BG
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
5
n3:rokUplatneniVysledku
n7:2011
n3:tvurceVysledku
Lavrentiev, Vasyl Khun, J. Vrňata, M. Bejšovec, Václav Horák, Pavel
n3:typAkce
n14:WRD
n3:wos
000306686700111
n3:zahajeniAkce
2011-09-21+02:00
s:numberOfPages
4
n16:hasPublisher
TANGER Ltd., Ostrava
n19:isbn
978-80-87294-27-7