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Statements

Subject Item
n2:RIV%2F61388955%3A_____%2F07%3A00088024%21RIV08-MSM-61388955
rdf:type
skos:Concept n14:Vysledek
dcterms:description
Mesoporous silicas are excellent hosts for incorporation of various guest molecules. The properties of the relatively inert silica surface can be drastically changes by the covalent grafting of functional groups, such as thiol-, amino- or alkylammonium ones, by silylation with chloro- or alkoxysilanes. While the silylation procedure has been optimized for powdered mesoporous silica materials with differing porosity, it has not been developed for mesoporous silica thin films yet, even if the obvious differences in diffusion properties and pore accessibility of powders and films would imply the different conditions needed for their silylation. Recently we have faced a serious problem of poor reproducibility of silylation procedure of silica films when investigating their applicability as a matrix for anchoring electrochemically active species and dye molecules. Therefore, the optimization of their silylation procedure has been aimed at in this communication. Mesoporous silicas are excellent hosts for incorporation of various guest molecules. The properties of the relatively inert silica surface can be drastically changes by the covalent grafting of functional groups, such as thiol-, amino- or alkylammonium ones, by silylation with chloro- or alkoxysilanes. While the silylation procedure has been optimized for powdered mesoporous silica materials with differing porosity, it has not been developed for mesoporous silica thin films yet, even if the obvious differences in diffusion properties and pore accessibility of powders and films would imply the different conditions needed for their silylation. Recently we have faced a serious problem of poor reproducibility of silylation procedure of silica films when investigating their applicability as a matrix for anchoring electrochemically active species and dye molecules. Therefore, the optimization of their silylation procedure has been aimed at in this communication. Vývoj postsyntetické silylační procedury pro tenké mesoporézní filmy SiO2 s kationickými trimethylaminopropylamoniovými skupinami, zaměřený na účinnou a reprodukovatelnou inkorporaci anionických molekul, jasně ukázal rozdílnou silylační reaktivitu filmů a práškových mesoporézních materiálů. Hlavní rozdíl je v případě filmů způsoben omezenou dostupností povrchu siliky pro silylační činidlo, což má za následek tendenci k blokování pórů pro delší reakční časy. Nízká koncentrace silylačního činidla a krátké reakční časy jsou proto nutnou podmínkou pro reprodukovatelnou silylaci tenkých mesoporézních filmů. Dále krátká aktivace povrchu v mírně alkalickém roztoku umožňuje dosáhnout optimální silylační efektivity.
dcterms:title
Optimization of the silylation procedure of thin mesoporous SiO2 films with cationic trimethylaminopropylammonium groups Optimization of the silylation procedure of thin mesoporous SiO2 films with cationic trimethylaminopropylammonium groups Optimalizace silylační procedury pro tenké mesoporézní filmy SiO2 s kationickými trimethylaminopropylamoniovými skupinami
skos:prefLabel
Optimization of the silylation procedure of thin mesoporous SiO2 films with cationic trimethylaminopropylammonium groups Optimization of the silylation procedure of thin mesoporous SiO2 films with cationic trimethylaminopropylammonium groups Optimalizace silylační procedury pro tenké mesoporézní filmy SiO2 s kationickými trimethylaminopropylamoniovými skupinami
skos:notation
RIV/61388955:_____/07:00088024!RIV08-MSM-61388955
n4:strany
573;577
n4:aktivita
n15:Z n15:R n15:P
n4:aktivity
P(1M0577), R, Z(AV0Z40400503)
n4:dodaniDat
n13:2008
n4:domaciTvurceVysledku
n5:5120500
n4:druhVysledku
n8:C
n4:duvernostUdaju
n18:S
n4:entitaPredkladatele
n17:predkladatel
n4:idSjednocenehoVysledku
439909
n4:idVysledku
RIV/61388955:_____/07:00088024
n4:jazykVysledku
n11:eng
n4:klicovaSlova
SiO2; cationic trimethylaminopropylammonium groups; mesoporous silicas
n4:klicoveSlovo
n12:mesoporous%20silicas n12:cationic%20trimethylaminopropylammonium%20groups n12:SiO2
n4:kontrolniKodProRIV
[49E742D3F160]
n4:mistoVydani
Amsterdam
n4:nazevEdiceCisloSvazku
Studies in surface science and catalysis
n4:nazevZdroje
Recent progress in mesostructured materials
n4:obor
n9:CF
n4:pocetDomacichTvurcuVysledku
1
n4:pocetTvurcuVysledku
3
n4:projekt
n10:1M0577
n4:rokUplatneniVysledku
n13:2007
n4:tvurceVysledku
Wark, M. Rathouský, Jiří Fattakhova Rohlfing, D.
n4:zamer
n20:AV0Z40400503
s:numberOfPages
5
n19:hasPublisher
Elsevier
n16:isbn
978-0-444-53084-4