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Statements

Subject Item
n2:RIV%2F60461373%3A22340%2F11%3A43891846%21RIV12-MSM-22340___
rdf:type
n16:Vysledek skos:Concept
dcterms:description
The development of new types of electronic devices based on conductive polymers requires precise and controlled deposition of these materials in thin layers. The book deals with synthesis and subsequent deposition of polypyrrole (PPY) thin films by advanced method - Matrix Assisted Pulsed Laser Evaporation (MAPLE). The topic of source-PPY preparation includes its chemical synthesis with %22surfactant%22 dopants (p-toluenesulfonic anion, dodecylbenzene sulfonic anion, dioctylsulfosuccinate anion and camphorsulfonic anion). The synthesis was carried out in order to optimize solubility and settlement time of PPY in various solvents - the parameters critical for successful transfer by MAPLE. The success of synthesis was verified by ATR-FTIR spectroscopy. The DC conductivity of synthesized polymer was also measured. The development of new types of electronic devices based on conductive polymers requires precise and controlled deposition of these materials in thin layers. The book deals with synthesis and subsequent deposition of polypyrrole (PPY) thin films by advanced method - Matrix Assisted Pulsed Laser Evaporation (MAPLE). The topic of source-PPY preparation includes its chemical synthesis with %22surfactant%22 dopants (p-toluenesulfonic anion, dodecylbenzene sulfonic anion, dioctylsulfosuccinate anion and camphorsulfonic anion). The synthesis was carried out in order to optimize solubility and settlement time of PPY in various solvents - the parameters critical for successful transfer by MAPLE. The success of synthesis was verified by ATR-FTIR spectroscopy. The DC conductivity of synthesized polymer was also measured.
dcterms:title
Deposition of Polypyrrole Thin Films by Advanced Method - Matrix Assisted Pulsed Laser Evaporation Deposition of Polypyrrole Thin Films by Advanced Method - Matrix Assisted Pulsed Laser Evaporation
skos:prefLabel
Deposition of Polypyrrole Thin Films by Advanced Method - Matrix Assisted Pulsed Laser Evaporation Deposition of Polypyrrole Thin Films by Advanced Method - Matrix Assisted Pulsed Laser Evaporation
skos:notation
RIV/60461373:22340/11:43891846!RIV12-MSM-22340___
n16:predkladatel
n21:orjk%3A22340
n3:aktivita
n7:Z n7:P
n3:aktivity
P(GAP108/11/1298), Z(MSM6046137306)
n3:dodaniDat
n15:2012
n3:domaciTvurceVysledku
n13:3717496 n13:8995230 n13:9315918
n3:druhVysledku
n12:B
n3:duvernostUdaju
n19:S
n3:entitaPredkladatele
n5:predkladatel
n3:idSjednocenehoVysledku
193387
n3:idVysledku
RIV/60461373:22340/11:43891846
n3:jazykVysledku
n11:eng
n3:klicovaSlova
deposition, polypyrrole
n3:klicoveSlovo
n9:deposition n9:polypyrrole
n3:kontrolniKodProRIV
[5A1BB7852E81]
n3:mistoVydani
New York, USA
n3:nazevEdiceCisloSvazku
neuveden
n3:nazevZdroje
Deposition of Polypyrrole Thin Films by Advanced Method - Matrix Assisted Pulsed Laser Evaporation
n3:obor
n4:JB
n3:pocetDomacichTvurcuVysledku
3
n3:pocetStranKnihy
80
n3:pocetTvurcuVysledku
4
n3:projekt
n10:GAP108%2F11%2F1298
n3:rokUplatneniVysledku
n15:2011
n3:tvurceVysledku
Vysloužil, Filip Fitl, Přemysl Kopecký, Dušan Vrňata, Martin
n3:zamer
n17:MSM6046137306
s:numberOfPages
80
n20:hasPublisher
Nova Publishers
n18:isbn
978-1-61209-623-0
n14:organizacniJednotka
22340