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Statements

Subject Item
n2:RIV%2F60461373%3A22320%2F10%3A00023813%21RIV11-MPO-22320___
rdf:type
skos:Concept n19:Vysledek
dcterms:description
DEVELOPMENT OF HELIUM PURIFICATION AND PURITY CONTROL METHODOLOGY FOR HIGH TEMPERATURE HELIUM LOOP IN NRI ŘEŽ, PLC. Within the scope of commissioning of High Temperature Helium Loop (HTHL) in NRI Řež plc. methods of helium purification and purity control are developed. In the first period the research was aimed to capacities of obtainable adsorbents for removal of impurities expected in helium in HTHL. At the same time development of analytical methods for monitoring of impurities concentration in helium based on gas chromatography with Helium Ionization Detector and infra red spectroscopy were developed and improved. In helium coolant of Very High Temperature Reactor (VHTR) hence in helium in HTHL these impurities are expected: CO, CO2, H2, H2O, CH4, O2, N2. Concentrations of these compounds are not range from approx. 0,1 ? 1000 ppmv. During first period of experiments removal of CO, CO2, CH4 and H2O on selected adsorbents was tested in laboratory-scale apparatus. According to results of experim DEVELOPMENT OF HELIUM PURIFICATION AND PURITY CONTROL METHODOLOGY FOR HIGH TEMPERATURE HELIUM LOOP IN NRI ŘEŽ, PLC. Within the scope of commissioning of High Temperature Helium Loop (HTHL) in NRI Řež plc. methods of helium purification and purity control are developed. In the first period the research was aimed to capacities of obtainable adsorbents for removal of impurities expected in helium in HTHL. At the same time development of analytical methods for monitoring of impurities concentration in helium based on gas chromatography with Helium Ionization Detector and infra red spectroscopy were developed and improved. In helium coolant of Very High Temperature Reactor (VHTR) hence in helium in HTHL these impurities are expected: CO, CO2, H2, H2O, CH4, O2, N2. Concentrations of these compounds are not range from approx. 0,1 ? 1000 ppmv. During first period of experiments removal of CO, CO2, CH4 and H2O on selected adsorbents was tested in laboratory-scale apparatus. According to results of experim DEVELOPMENT OF HELIUM PURIFICATION AND PURITY CONTROL METHODOLOGY FOR HIGH TEMPERATURE HELIUM LOOP IN NRI ŘEŽ, PLC. Within the scope of commissioning of High Temperature Helium Loop (HTHL) in NRI Řež plc. methods of helium purification and purity control are developed. In the first period the research was aimed to capacities of obtainable adsorbents for removal of impurities expected in helium in HTHL. At the same time development of analytical methods for monitoring of impurities concentration in helium based on gas chromatography with Helium Ionization Detector and infra red spectroscopy were developed and improved. In helium coolant of Very High Temperature Reactor (VHTR) hence in helium in HTHL these impurities are expected: CO, CO2, H2, H2O, CH4, O2, N2. Concentrations of these compounds are not range from approx. 0,1 ? 1000 ppmv. During first period of experiments removal of CO, CO2, CH4 and H2O on selected adsorbents was tested in laboratory-scale apparatus. According to results of experim
dcterms:title
VÝVOJ METODIKY ČIŠTĚNÍ A KONTROLY ČISTOTY HELIA PRO VYSOKOTEPLOTNÍ HELIOVOU SMYČKU V ÚJV ŘEŽ A.S. VÝVOJ METODIKY ČIŠTĚNÍ A KONTROLY ČISTOTY HELIA PRO VYSOKOTEPLOTNÍ HELIOVOU SMYČKU V ÚJV ŘEŽ A.S. development of methodology of helium purification and purity control for High Temperature Helium Loop in NRI Rez plc.
skos:prefLabel
VÝVOJ METODIKY ČIŠTĚNÍ A KONTROLY ČISTOTY HELIA PRO VYSOKOTEPLOTNÍ HELIOVOU SMYČKU V ÚJV ŘEŽ A.S. VÝVOJ METODIKY ČIŠTĚNÍ A KONTROLY ČISTOTY HELIA PRO VYSOKOTEPLOTNÍ HELIOVOU SMYČKU V ÚJV ŘEŽ A.S. development of methodology of helium purification and purity control for High Temperature Helium Loop in NRI Rez plc.
skos:notation
RIV/60461373:22320/10:00023813!RIV11-MPO-22320___
n3:aktivita
n16:P n16:Z
n3:aktivity
P(2A-1TP1/100), Z(MSM6046137304)
n3:dodaniDat
n10:2011
n3:domaciTvurceVysledku
n4:9660178 n4:4753607 n4:3427854
n3:druhVysledku
n12:D
n3:duvernostUdaju
n20:S
n3:entitaPredkladatele
n21:predkladatel
n3:idSjednocenehoVysledku
298014
n3:idVysledku
RIV/60461373:22320/10:00023813
n3:jazykVysledku
n22:cze
n3:klicovaSlova
VHTR; HTHL; helium loop; CO; CO2; CH4; H2; H2O; O2; N2; adsorption; GC-HID; molecular sieves; helium
n3:klicoveSlovo
n6:H2O n6:HTHL n6:VHTR n6:H2 n6:CO n6:CO2 n6:molecular%20sieves n6:N2 n6:GC-HID n6:adsorption n6:O2 n6:helium%20loop n6:CH4 n6:helium
n3:kontrolniKodProRIV
[88F99B329E11]
n3:mistoKonaniAkce
Praha
n3:mistoVydani
Praha
n3:nazevZdroje
CHEO 8
n3:obor
n8:JF
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
4
n3:projekt
n18:2A-1TP1%2F100
n3:rokUplatneniVysledku
n10:2010
n3:tvurceVysledku
Berka, Jan Skoblia, Siarhei Černý, Michal Tekáč, Viktor
n3:typAkce
n14:EUR
n3:zahajeniAkce
2010-01-01+01:00
n3:zamer
n17:MSM6046137304
s:numberOfPages
16
n11:hasPublisher
Vysoká škola chemicko-technologická v Praze
n15:isbn
978-80-7080-766-8
n13:organizacniJednotka
22320