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Statements

Subject Item
n2:RIV%2F60461373%3A22310%2F14%3A43898482%21RIV15-GA0-22310___
rdf:type
skos:Concept n18:Vysledek
rdfs:seeAlso
http://www.aidic.it/cet/14/41/064.pdf
dcterms:description
Iron oxide (alpha-Fe2O3) in hematite crystalline structure and tungsten trioxide have recently attracted much attention as possibly convenient materials to be used for hydrogen production via photoelectrochemical water splitting. Thius is due to their favorable properties such as band gaps between 2.0 - 2.2 eV (alpha-Fe2O3) and 2.5-2.8 eV (WO3) which allows absorbing of a substantial fraction of solar spectrum. FTO glass substrates were used for both types of films. Tungsten trioxide films were prepared by sedimentation of WO3 particles and further annealing at different temperatures to improve adhesion. Iron oxide (alpha-Fe2O3) hematite films were prepared by advanced pulsed plasma deposition method of High Power Impulse Magnetron Sputtering (HiPIMS). The films were evaluated on the basis of physical properties such as crystalline structure, surface topography and electrical behavior. The functional properties were investigated under simulated photoelectrochemical (PEC) water splitting conditions. Different excitation lights were used: monochromatic (very narrow single peak at light spectra) and the standard solar illumination conditions (AM 1.5 G). Also the influence of the electrolyte/electrode and substrate/electrode illumination of layers was studied. As deposited WO3 films have rather small photocurrents. Higher annealing temperature results in better adhesion of particles and increase in photocurrent. Optimum annealing temperature is 450-500 degrees C. Increase of the annealing temperature to 600 degrees C caused the formation of undesirable crystal phases (produced by the reaction of WO3 and FTO layer) and significant decrease in photocurrent. Despite confirmed hematite phase of as-deposited films, these were almost photoelectrochemically inactive. Iron oxide (alpha-Fe2O3) in hematite crystalline structure and tungsten trioxide have recently attracted much attention as possibly convenient materials to be used for hydrogen production via photoelectrochemical water splitting. Thius is due to their favorable properties such as band gaps between 2.0 - 2.2 eV (alpha-Fe2O3) and 2.5-2.8 eV (WO3) which allows absorbing of a substantial fraction of solar spectrum. FTO glass substrates were used for both types of films. Tungsten trioxide films were prepared by sedimentation of WO3 particles and further annealing at different temperatures to improve adhesion. Iron oxide (alpha-Fe2O3) hematite films were prepared by advanced pulsed plasma deposition method of High Power Impulse Magnetron Sputtering (HiPIMS). The films were evaluated on the basis of physical properties such as crystalline structure, surface topography and electrical behavior. The functional properties were investigated under simulated photoelectrochemical (PEC) water splitting conditions. Different excitation lights were used: monochromatic (very narrow single peak at light spectra) and the standard solar illumination conditions (AM 1.5 G). Also the influence of the electrolyte/electrode and substrate/electrode illumination of layers was studied. As deposited WO3 films have rather small photocurrents. Higher annealing temperature results in better adhesion of particles and increase in photocurrent. Optimum annealing temperature is 450-500 degrees C. Increase of the annealing temperature to 600 degrees C caused the formation of undesirable crystal phases (produced by the reaction of WO3 and FTO layer) and significant decrease in photocurrent. Despite confirmed hematite phase of as-deposited films, these were almost photoelectrochemically inactive.
dcterms:title
Photo-electrochemical properties of WO3 and alpha-Fe2O3 thin films Photo-electrochemical properties of WO3 and alpha-Fe2O3 thin films
skos:prefLabel
Photo-electrochemical properties of WO3 and alpha-Fe2O3 thin films Photo-electrochemical properties of WO3 and alpha-Fe2O3 thin films
skos:notation
RIV/60461373:22310/14:43898482!RIV15-GA0-22310___
n3:aktivita
n9:P
n3:aktivity
P(GAP108/12/2104)
n3:dodaniDat
n15:2015
n3:domaciTvurceVysledku
n14:8453047 n14:3910245
n3:druhVysledku
n13:D
n3:duvernostUdaju
n23:S
n3:entitaPredkladatele
n21:predkladatel
n3:idSjednocenehoVysledku
36485
n3:idVysledku
RIV/60461373:22310/14:43898482
n3:jazykVysledku
n16:eng
n3:klicovaSlova
photo-electrochemical properties, water splitting; particle layers; magnetron sputtering; TiO2; WO3
n3:klicoveSlovo
n6:photo-electrochemical%20properties n6:particle%20layers n6:TiO2 n6:WO3 n6:magnetron%20sputtering n6:water%20splitting
n3:kontrolniKodProRIV
[2D8063536689]
n3:mistoKonaniAkce
Chia
n3:mistoVydani
Milano
n3:nazevZdroje
Chemical Engineering Transactions
n3:obor
n10:CG
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
4
n3:projekt
n17:GAP108%2F12%2F2104
n3:rokUplatneniVysledku
n15:2014
n3:tvurceVysledku
Zlámal, Martin Krýsa, Josef Kment, Štěpán Hubička, Zdeněk
n3:typAkce
n12:WRD
n3:wos
000346539800064
n3:zahajeniAkce
2014-09-28+02:00
s:issn
2283-9216
s:numberOfPages
6
n20:doi
10.3303/CET1441064
n7:hasPublisher
AIDIC Servizi
n19:isbn
978-88-95608-32-7
n4:organizacniJednotka
22310