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Statements

Subject Item
n2:RIV%2F60461373%3A22310%2F11%3A43894356%21RIV15-MSM-22310___
rdf:type
skos:Concept n18:Vysledek
dcterms:description
We report about design, fabrication and properties of the polymer optical waveguides deposited on silica-on-silicon substrate. The design of the waveguides is based on a concept that geometric dimensions of the single mode polymer waveguide are determined by geometrical parameters of the silica layer. The design of the waveguides was schemed for 650 nm, 850 nm, 1310 nm and 1550 nm wavelength. The design of the presented planar waveguides was realized on the bases of modified dispersion equation while the ridge waveguides design was proposed following the Fischbeck concept. Both designs were refined applying RSoft software using beam propagation method. Proposed shapes of the waveguides were etched by standard photolithography process into the silica layers and polymer waveguide layers were subsequently deposited into the treated substrate by spin coating. Poly(methylmethacrylimide) was used as the waveguide core material and polymethylmethacrylate was used as a cover protection layer. Propagation optical loss measurements were done by using the cut-back method and the best samples had optical losses lower than 0.6 dB/cm at 650 nm, 1310 nm and 1550 nm. We report about design, fabrication and properties of the polymer optical waveguides deposited on silica-on-silicon substrate. The design of the waveguides is based on a concept that geometric dimensions of the single mode polymer waveguide are determined by geometrical parameters of the silica layer. The design of the waveguides was schemed for 650 nm, 850 nm, 1310 nm and 1550 nm wavelength. The design of the presented planar waveguides was realized on the bases of modified dispersion equation while the ridge waveguides design was proposed following the Fischbeck concept. Both designs were refined applying RSoft software using beam propagation method. Proposed shapes of the waveguides were etched by standard photolithography process into the silica layers and polymer waveguide layers were subsequently deposited into the treated substrate by spin coating. Poly(methylmethacrylimide) was used as the waveguide core material and polymethylmethacrylate was used as a cover protection layer. Propagation optical loss measurements were done by using the cut-back method and the best samples had optical losses lower than 0.6 dB/cm at 650 nm, 1310 nm and 1550 nm.
dcterms:title
Design, Fabrication and Properties of Rib Poly(methylmethacrylimide) Optical Waveguides Design, Fabrication and Properties of Rib Poly(methylmethacrylimide) Optical Waveguides
skos:prefLabel
Design, Fabrication and Properties of Rib Poly(methylmethacrylimide) Optical Waveguides Design, Fabrication and Properties of Rib Poly(methylmethacrylimide) Optical Waveguides
skos:notation
RIV/60461373:22310/11:43894356!RIV15-MSM-22310___
n3:aktivita
n11:Z n11:I n11:S n11:P
n3:aktivity
I, P(GP102/09/P104), S, Z(MSM6840770014)
n3:cisloPeriodika
2
n3:dodaniDat
n4:2015
n3:domaciTvurceVysledku
n12:1717219 n12:7662211 n12:5592267 n12:5784484
n3:druhVysledku
n16:J
n3:duvernostUdaju
n14:S
n3:entitaPredkladatele
n6:predkladatel
n3:idSjednocenehoVysledku
193532
n3:idVysledku
RIV/60461373:22310/11:43894356
n3:jazykVysledku
n19:eng
n3:klicovaSlova
photolithography; poly(methylmethacrylimide); polymer; Optical ridge waveguide
n3:klicoveSlovo
n9:polymer n9:photolithography n9:Optical%20ridge%20waveguide n9:poly%28methylmethacrylimide%29
n3:kodStatuVydavatele
CZ - Česká republika
n3:kontrolniKodProRIV
[A11D90E31D5A]
n3:nazevZdroje
Radioengineering
n3:obor
n15:CA
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
7
n3:projekt
n5:GP102%2F09%2FP104
n3:rokUplatneniVysledku
n4:2011
n3:svazekPeriodika
20
n3:tvurceVysledku
Špirková, Jarmila Lyutakov, Oleksiy Jeřábek, Vítězslav Hüttel, Ivan Klapuch, Jan Prajzler, Václav Nekvindová, Pavla
n3:wos
000292031600018
n3:zamer
n13:MSM6840770014
s:issn
1210-2512
s:numberOfPages
7
n17:organizacniJednotka
22310