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Statements

Subject Item
n2:RIV%2F60461373%3A22310%2F08%3A00020173%21RIV09-AV0-22310___
rdf:type
n7:Vysledek skos:Concept
dcterms:description
Různé techniky byly použity pro přípravu tenkých nanovrstev oxidu titaničitého. Nanášení vrstev bylo prováděno v prostředí chemicky aktivního plazmatu za využití přístrojů PVD ?hollow cathode plasma? sputtering systémem, PVD magnetronovým sputteringem a PECVD technologií využívající surfatronovou plasmu. Příprava vrstev metodou sol-gel probíhala v prostředí reverzních micel. Všechny typy vrstev byly testovány na foto-indukované elektrochemické vlastnosti na základě vyhodnocení polarizačních křivek a odpovídajících fotoproudů Various techniques were used for the preparation of titanium (IV) oxide nanoscaled thin films. The deposition of the layers was carried out in the environmental of chemically active plasma due to the utilization of plasma assisted device including PVD hollow cathode plasma jet sputtering system, PVD magnetron sputtering and PECVD technique using surfatron produced plasma discharge as a jet type. The sol-gel process realized in the reverse micelle environment was chosen as a purely chemical procedure. All type were tested then for their photo-induced electrochemical properties based on evaluation of polarization curves and corresponding photocurrents. Various techniques were used for the preparation of titanium (IV) oxide nanoscaled thin films. The deposition of the layers was carried out in the environmental of chemically active plasma due to the utilization of plasma assisted device including PVD hollow cathode plasma jet sputtering system, PVD magnetron sputtering and PECVD technique using surfatron produced plasma discharge as a jet type. The sol-gel process realized in the reverse micelle environment was chosen as a purely chemical procedure. All type were tested then for their photo-induced electrochemical properties based on evaluation of polarization curves and corresponding photocurrents.
dcterms:title
Plasmatické nanášení a fotoelektrochemické vlastnosti tenkých vrstev oxidu titaničitého Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers
skos:prefLabel
Plasmatické nanášení a fotoelektrochemické vlastnosti tenkých vrstev oxidu titaničitého Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers
skos:notation
RIV/60461373:22310/08:00020173!RIV09-AV0-22310___
n3:aktivita
n16:P
n3:aktivity
P(1M0577), P(KAN400720701)
n3:dodaniDat
n15:2009
n3:domaciTvurceVysledku
n11:1946609 n11:3910245
n3:druhVysledku
n20:D
n3:duvernostUdaju
n9:S
n3:entitaPredkladatele
n19:predkladatel
n3:idSjednocenehoVysledku
386779
n3:idVysledku
RIV/60461373:22310/08:00020173
n3:jazykVysledku
n17:eng
n3:klicovaSlova
PVD; sol-gel; titanium dioxide; photocurrent
n3:klicoveSlovo
n12:photocurrent n12:PVD n12:titanium%20dioxide n12:sol-gel
n3:kontrolniKodProRIV
[CADEA1FCBBF9]
n3:mistoKonaniAkce
Hnanice
n3:mistoVydani
Praha
n3:nazevZdroje
Proceedings of the workshop Recent advances in photochemistry, electrochemistry and photocatalysis
n3:obor
n4:CH
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
7
n3:projekt
n18:1M0577 n18:KAN400720701
n3:rokUplatneniVysledku
n15:2008
n3:tvurceVysledku
Klusoň, Petr Straňák, V. Krýsa, Josef Hubička, Martin Čada, M. Virostko, P. Kment, Š.
n3:typAkce
n13:EUR
n3:zahajeniAkce
2007-12-04+01:00
s:numberOfPages
3
n14:hasPublisher
Vysoká škola chemicko-technologická v Praze
n21:isbn
978-80-7080-680-7
n6:organizacniJednotka
22310