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Subject Item
n2:RIV%2F60076658%3A12410%2F05%3A00006411%21RIV06-MSM-12410___
rdf:type
n14:Vysledek skos:Concept
dcterms:description
The plasma enhanced hot filament chemical vapor deposition used for deposition of carbon nanotubes was investigated using Langmuir probes and optical emission spectroscopy. The electron density, electron temperature and plasma potential were measured in relation to the discharge voltage and substrate temperature. The results are discussed in connection with the conditions for the nanotubes' growth. It is demonstrated that the production of reactive heavy particles takes place predominantly in the sheath region, close to the negative biased substrate. Model calculations demonstrate the role of the electrical forces on the aligned growth of nanotubes and optimum properties for electron field emission from the nanotube tips. The plasma enhanced hot filament chemical vapor deposition used for deposition of carbon nanotubes was investigated using Langmuir probes and optical emission spectroscopy. The electron density, electron temperature and plasma potential were measured in relation to the discharge voltage and substrate temperature. The results are discussed in connection with the conditions for the nanotubes' growth. It is demonstrated that the production of reactive heavy particles takes place predominantly in the sheath region, close to the negative biased substrate. Model calculations demonstrate the role of the electrical forces on the aligned growth of nanotubes and optimum properties for electron field emission from the nanotube tips. Proces PECVD při depozici uhlíkových nanotrubic byl studován prostřednictvím Langmuirovy sondy a optické spektroskopie. Elektronová hustota a teplota a potenciál plazmatu byly analyzovány ve vztahu k napětí výboje a teplotě substrátu. Výsledky jsou diskutovány v souvislosti s podmínkami růstu nanotrubic. Je ukázáno, že produkce těžkých částic probíhá především v příelektrodové oblasti, v blízkosti substrátu o záporném napětí. Modelové výpočty demonstrují vliv elektrických sil na zarovnaný růst nanotrubic a stanovují optimální podmínky pro polní emisi elektronů z jejich zakončení.
dcterms:title
Experimental and Theoretical Investigation of Plasma Enhanced Hot filament Chemical Vapour Deposition of Carbon Nanotubes Experimentální a teoretický výzkum depozice uhlíkových nanotrubic metodou PE CVD Experimental and Theoretical Investigation of Plasma Enhanced Hot filament Chemical Vapour Deposition of Carbon Nanotubes
skos:prefLabel
Experimental and Theoretical Investigation of Plasma Enhanced Hot filament Chemical Vapour Deposition of Carbon Nanotubes Experimentální a teoretický výzkum depozice uhlíkových nanotrubic metodou PE CVD Experimental and Theoretical Investigation of Plasma Enhanced Hot filament Chemical Vapour Deposition of Carbon Nanotubes
skos:notation
RIV/60076658:12410/05:00006411!RIV06-MSM-12410___
n3:strany
58-62
n3:aktivita
n8:Z
n3:aktivity
Z(MSM 124100004)
n3:dodaniDat
n12:2006
n3:domaciTvurceVysledku
n10:9384065 n10:1510010
n3:druhVysledku
n16:C
n3:duvernostUdaju
n7:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
521013
n3:idVysledku
RIV/60076658:12410/05:00006411
n3:jazykVysledku
n17:eng
n3:klicovaSlova
carbon nanotube; PECVD; plasma diagnostics; model calculations; field emission
n3:klicoveSlovo
n9:field%20emission n9:PECVD n9:plasma%20diagnostics n9:model%20calculations n9:carbon%20nanotube
n3:kontrolniKodProRIV
[33A481A9688E]
n3:mistoVydani
Ankara
n3:nazevZdroje
In: M. Mutlu, G. Dinescu, R. Förch, J.M.M. Martinez, J. Vyskocil (Eds) Plasma Polymers and Related Materials
n3:obor
n19:BL
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
5
n3:rokUplatneniVysledku
n12:2005
n3:tvurceVysledku
Taeschner, Ch. Leonhardt, Albert Špatenka, Petr Blažek, Josef Pácal, F.
n3:zamer
n4:MSM%20124100004
s:numberOfPages
5
n15:hasPublisher
Hacettepe University Press
n20:isbn
975-491-194-0
n6:organizacniJednotka
12410