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Statements

Subject Item
n2:RIV%2F49777513%3A23640%2F10%3A00503489%21RIV11-MSM-23640___
rdf:type
skos:Concept n20:Vysledek
dcterms:description
A study of the effect of substrate temperature on oblique-angle sputtered galium- doped zinc oxide (GZO) thin films was carried out. Both the oblique-angle sputtering and the substrate temperature lowered the resistivity of GZO thin films down to 4 x 10 -3 ohm cm together with an increase of their optical transmittance over 90%. A study of the effect of substrate temperature on oblique-angle sputtered galium- doped zinc oxide (GZO) thin films was carried out. Both the oblique-angle sputtering and the substrate temperature lowered the resistivity of GZO thin films down to 4 x 10 -3 ohm cm together with an increase of their optical transmittance over 90%.
dcterms:title
Effect of Substrate Temperature on Oblique-Angle Sputtered ZnO:Ga Thin Films Effect of Substrate Temperature on Oblique-Angle Sputtered ZnO:Ga Thin Films
skos:prefLabel
Effect of Substrate Temperature on Oblique-Angle Sputtered ZnO:Ga Thin Films Effect of Substrate Temperature on Oblique-Angle Sputtered ZnO:Ga Thin Films
skos:notation
RIV/49777513:23640/10:00503489!RIV11-MSM-23640___
n6:aktivita
n9:P
n6:aktivity
P(1M06031)
n6:dodaniDat
n11:2011
n6:domaciTvurceVysledku
n14:1889788 n14:8498989
n6:druhVysledku
n17:D
n6:duvernostUdaju
n21:S
n6:entitaPredkladatele
n16:predkladatel
n6:idSjednocenehoVysledku
256183
n6:idVysledku
RIV/49777513:23640/10:00503489
n6:jazykVysledku
n13:eng
n6:klicovaSlova
oblique-angle sputtering; ZnO:Ga; deposition temperature
n6:klicoveSlovo
n7:deposition%20temperature n7:ZnO%3AGa n7:oblique-angle%20sputtering
n6:kontrolniKodProRIV
[606F2814B66B]
n6:mistoKonaniAkce
Smolenice Castle, Slovakia
n6:mistoVydani
New York
n6:nazevZdroje
ASDAM 2010
n6:obor
n19:BM
n6:pocetDomacichTvurcuVysledku
2
n6:pocetTvurcuVysledku
8
n6:projekt
n15:1M06031
n6:rokUplatneniVysledku
n11:2010
n6:tvurceVysledku
Schaaf, P. Novotný, Ivan Kotorová, Dominika Flickyngerová, Soňa Tvarožek, Vladimír Spiess, L. Netrvalová, Marie Šutta, Pavol
n6:typAkce
n10:WRD
n6:zahajeniAkce
2010-01-01+01:00
s:numberOfPages
4
n18:hasPublisher
IEEE Nuclear and Plasma Sciences Society
n3:isbn
978-1-4244-8572-7
n4:organizacniJednotka
23640