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Statements

Subject Item
n2:RIV%2F49777513%3A23640%2F10%3A00503179%21RIV11-MSM-23640___
rdf:type
n11:Vysledek skos:Concept
dcterms:description
The article deals with structural properties of ZnO thin layers prepared on Si (111) by pulsed laser deposition at different pressures (1?35 Pa) of ambient oxygen in the deposition chamber. The growth temperature was 400 °C and a pulsed Nd:YAG laser was used at a wavelength of 355 nm. Two parallel sets of samples deposited by ablation of different targets (a sintered ceramic pellet of ZnO and a pure metallic Zn target) were examined. The samples were characterized by different analytical methods: scanning electron microscope (SEM), secondary ion mass spectroscopy (SIMS), and X-ray diffraction (XRD). The prepared layers exhibited columnar structure and uniform preferred c-axis orientation. The results showed that the high quality of ZnO films fabricated from both targets is comparable, except for those obtained at low (1 Pa) pressures. The article deals with structural properties of ZnO thin layers prepared on Si (111) by pulsed laser deposition at different pressures (1?35 Pa) of ambient oxygen in the deposition chamber. The growth temperature was 400 °C and a pulsed Nd:YAG laser was used at a wavelength of 355 nm. Two parallel sets of samples deposited by ablation of different targets (a sintered ceramic pellet of ZnO and a pure metallic Zn target) were examined. The samples were characterized by different analytical methods: scanning electron microscope (SEM), secondary ion mass spectroscopy (SIMS), and X-ray diffraction (XRD). The prepared layers exhibited columnar structure and uniform preferred c-axis orientation. The results showed that the high quality of ZnO films fabricated from both targets is comparable, except for those obtained at low (1 Pa) pressures.
dcterms:title
Study of ZnO layer growth by pulsed laser deposition from Zn and ZnO targets Study of ZnO layer growth by pulsed laser deposition from Zn and ZnO targets
skos:prefLabel
Study of ZnO layer growth by pulsed laser deposition from Zn and ZnO targets Study of ZnO layer growth by pulsed laser deposition from Zn and ZnO targets
skos:notation
RIV/49777513:23640/10:00503179!RIV11-MSM-23640___
n3:aktivita
n7:P
n3:aktivity
P(1M06031)
n3:cisloPeriodika
1
n3:dodaniDat
n10:2011
n3:domaciTvurceVysledku
n14:1889788
n3:druhVysledku
n8:J
n3:duvernostUdaju
n18:S
n3:entitaPredkladatele
n16:predkladatel
n3:idSjednocenehoVysledku
290883
n3:idVysledku
RIV/49777513:23640/10:00503179
n3:jazykVysledku
n13:eng
n3:klicovaSlova
ZnO; Pulsed laser deposition; ZnO target; Zn target, Thin film
n3:klicoveSlovo
n4:ZnO n4:Pulsed%20laser%20deposition n4:Zn%20target n4:ZnO%20target n4:Thin%20film
n3:kodStatuVydavatele
GB - Spojené království Velké Británie a Severního Irska
n3:kontrolniKodProRIV
[E8853DCC5020]
n3:nazevZdroje
Vacuum
n3:obor
n17:BM
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
3
n3:projekt
n9:1M06031
n3:rokUplatneniVysledku
n10:2010
n3:svazekPeriodika
84
n3:tvurceVysledku
Vincze, Andrej Netrvalová, Marie Bruncko, Jaroslav
n3:wos
000270625900042
s:issn
0042-207X
s:numberOfPages
4
n15:organizacniJednotka
23640