This HTML5 document contains 41 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
dctermshttp://purl.org/dc/terms/
n8http://purl.org/net/nknouf/ns/bibtex#
n5http://localhost/temp/predkladatel/
n6http://linked.opendata.cz/resource/domain/vavai/projekt/
n16http://linked.opendata.cz/ontology/domain/vavai/
n17http://linked.opendata.cz/resource/domain/vavai/zamer/
n15https://schema.org/
shttp://schema.org/
skoshttp://www.w3.org/2004/02/skos/core#
n3http://linked.opendata.cz/ontology/domain/vavai/riv/
n12http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F49777513%3A23520%2F99%3A00042299%21RIV%2F2000%2FMSM%2F235200/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n18http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n14http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n4http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n13http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n7http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n11http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F99%3A00042299%21RIV%2F2000%2FMSM%2F235200
rdf:type
skos:Concept n16:Vysledek
dcterms:description
CNx films were deposited on Si(100) substrates at a substrate temperature of 600 C using DC magnetron sputtering of a high-purity graphite target in pure nitrogen. The film characteristics were primarily controlled by the pressure, p, (0.05 to 5 Pa), thedischarge current in the magnetron target, Im, (0.5 to 3 A), and the RF-induced negative substrate bias voltage, Ub, (-300 to -1200 V). The films were found to be amorphous, and they possessed the N/C atomic concentration ratio up to 0.35, the hardness uto 40 GPa, the elastic recovery up to 85%, and good adhesion and promising tribological properties. A complex relationship between the process parameters and the film characteristics was investigated on the basis of correlations between the process parameters and the respective internal plasma parameters, such as ion bombardment characteristics and the densities of N atoms and CN radicals in front of the substrate. CNx films were deposited on Si(100) substrates at a substrate temperature of 600 C using DC magnetron sputtering of a high-purity graphite target in pure nitrogen. The film characteristics were primarily controlled by the pressure, p, (0.05 to 5 Pa), thedischarge current in the magnetron target, Im, (0.5 to 3 A), and the RF-induced negative substrate bias voltage, Ub, (-300 to -1200 V). The films were found to be amorphous, and they possessed the N/C atomic concentration ratio up to 0.35, the hardness uto 40 GPa, the elastic recovery up to 85%, and good adhesion and promising tribological properties. A complex relationship between the process parameters and the film characteristics was investigated on the basis of correlations between the process parameters and the respective internal plasma parameters, such as ion bombardment characteristics and the densities of N atoms and CN radicals in front of the substrate.
dcterms:title
Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone
skos:prefLabel
Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone
skos:notation
RIV/49777513:23520/99:00042299!RIV/2000/MSM/235200
n3:strany
1497
n3:aktivita
n4:Z n4:P
n3:aktivity
P(GV106/96/K245), P(VS96059), Z(MSM 235200002)
n3:dodaniDat
n11:2000
n3:domaciTvurceVysledku
Vlček, Jaroslav Rusňák, Karel Hájek, Václav
n3:druhVysledku
n13:C
n3:duvernostUdaju
n18:S
n3:entitaPredkladatele
n12:predkladatel
n3:idSjednocenehoVysledku
752006
n3:idVysledku
RIV/49777513:23520/99:00042299
n3:jazykVysledku
n14:eng
n3:kontrolniKodProRIV
[57A62C4CE58F]
n3:mistoVydani
Praha
n3:nazevEdiceCisloSvazku
Roč.^14
n3:nazevZdroje
Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone
n3:obor
n7:BL
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
3
n3:projekt
n6:VS96059 n6:GV106%2F96%2FK245
n3:rokUplatneniVysledku
n11:1999
n3:tvurceVysledku
Rusňák, Karel Hájek, Václav Vlček, Jaroslav
n3:zamer
n17:MSM%20235200002
s:numberOfPages
6
n8:hasPublisher
Akademie věd České republiky
n15:isbn
80-902724-0-1
n5:organizacniJednotka
23520