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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F14%3A43922810%21RIV15-GA0-23520___
rdf:type
skos:Concept n14:Vysledek
rdfs:seeAlso
http://dx.doi.org/10.1016/j.surfcoat.2013.12.007
dcterms:description
Hf-B-Si-C films were deposited onto silicon and glass substrates using pulsed magnetron co-sputtering of a single B4C-Hf-Si target (at a fixed 15% Hf fraction and a varying 0-50% Si fraction in the target erosion area) in pure argon. We focus on the effect of the Si content in the films. The film structure changes from nanocolumnar (at 0-7 at.% of Si) to nanocomposite (at around 10 at.% of Si) to amorphous (at higher Si contents). Both nanocolumnar and nanocomposite HfB2-based films exhibit a hardness of up to 37 GPa and a high H/E* ratio of around 0.15. The Si incorporation leads to a significant reduction of the compressive stress of films and improvement of their oxidation resistance (unmeasurable mass change after annealing up to 800 °C at 35 at.% of Si). All films exhibit a high electrical conductivity and very smooth defect-free surfaces with an average roughness below 1 nm. Consequently, the films may be used as a new class of hard and electrically conductive protective coatings with a high oxidation resistance at elevated temperatures. Hf-B-Si-C films were deposited onto silicon and glass substrates using pulsed magnetron co-sputtering of a single B4C-Hf-Si target (at a fixed 15% Hf fraction and a varying 0-50% Si fraction in the target erosion area) in pure argon. We focus on the effect of the Si content in the films. The film structure changes from nanocolumnar (at 0-7 at.% of Si) to nanocomposite (at around 10 at.% of Si) to amorphous (at higher Si contents). Both nanocolumnar and nanocomposite HfB2-based films exhibit a hardness of up to 37 GPa and a high H/E* ratio of around 0.15. The Si incorporation leads to a significant reduction of the compressive stress of films and improvement of their oxidation resistance (unmeasurable mass change after annealing up to 800 °C at 35 at.% of Si). All films exhibit a high electrical conductivity and very smooth defect-free surfaces with an average roughness below 1 nm. Consequently, the films may be used as a new class of hard and electrically conductive protective coatings with a high oxidation resistance at elevated temperatures.
dcterms:title
Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering
skos:prefLabel
Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering
skos:notation
RIV/49777513:23520/14:43922810!RIV15-GA0-23520___
n3:aktivita
n10:P
n3:aktivity
P(GA14-03875S)
n3:cisloPeriodika
257
n3:dodaniDat
n11:2015
n3:domaciTvurceVysledku
n5:8233152 n5:9684328 n5:1975714 n5:8341729 n5:2574993 n5:3903230 n5:3554392
n3:druhVysledku
n20:J
n3:duvernostUdaju
n12:S
n3:entitaPredkladatele
n13:predkladatel
n3:idSjednocenehoVysledku
18774
n3:idVysledku
RIV/49777513:23520/14:43922810
n3:jazykVysledku
n19:eng
n3:klicovaSlova
Oxidation resistance; Electrical conductivity; Hardness; Pulsed magnetron sputtering; Nanocomposite materials; Hf-B-Si-C films
n3:klicoveSlovo
n7:Electrical%20conductivity n7:Oxidation%20resistance n7:Nanocomposite%20materials n7:Hf-B-Si-C%20films n7:Pulsed%20magnetron%20sputtering n7:Hardness
n3:kodStatuVydavatele
GB - Spojené království Velké Británie a Severního Irska
n3:kontrolniKodProRIV
[A9FADFD343DC]
n3:nazevZdroje
Surface and Coatings Technology
n3:obor
n17:BL
n3:pocetDomacichTvurcuVysledku
7
n3:pocetTvurcuVysledku
10
n3:projekt
n8:GA14-03875S
n3:rokUplatneniVysledku
n11:2014
n3:svazekPeriodika
2014
n3:tvurceVysledku
Meletis, Efstathios I. Čerstvý, Radomír Zeman, Petr Zuzjaková, Šárka Mareš, Pavel Houška, Jiří Vlček, Jaroslav Zhang, Minghui Jiang, Jiechao Kohout, Jiří
n3:wos
000344423100030
s:issn
0257-8972
s:numberOfPages
7
n15:doi
10.1016/j.surfcoat.2013.12.007
n18:organizacniJednotka
23520