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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F13%3A43917963%21RIV14-GA0-23520___
rdf:type
skos:Concept n13:Vysledek
rdfs:seeAlso
http://iopscience.iop.org/0022-3727/46/10/105203
dcterms:description
We use a non-stationary two-zone model to verify predictions of a steady-state phenomenological model (Vlček and Burcalová) under the conditions in typical high-power impulse magnetron sputtering discharges. It is shown that the steady-state phenomenological model provides a reliable description of fundamental deposition parameters characterizing efficiency of magnetron sputtering and the transfer of target material ions to the substrate in these discharges with relatively long steady-state discharge regimes established during pulses. Based on the results, we recommend to lower the magnetic field strength in a magnetron system at a fixed average target power density in a pulse and thereby use a higher magnetron voltage in order to enhance the deposition rate and keep or even increase the ionized fraction of sputtered target material atoms in the flux onto the substrate. We use a non-stationary two-zone model to verify predictions of a steady-state phenomenological model (Vlček and Burcalová) under the conditions in typical high-power impulse magnetron sputtering discharges. It is shown that the steady-state phenomenological model provides a reliable description of fundamental deposition parameters characterizing efficiency of magnetron sputtering and the transfer of target material ions to the substrate in these discharges with relatively long steady-state discharge regimes established during pulses. Based on the results, we recommend to lower the magnetic field strength in a magnetron system at a fixed average target power density in a pulse and thereby use a higher magnetron voltage in order to enhance the deposition rate and keep or even increase the ionized fraction of sputtered target material atoms in the flux onto the substrate.
dcterms:title
Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges
skos:prefLabel
Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges
skos:notation
RIV/49777513:23520/13:43917963!RIV14-GA0-23520___
n13:predkladatel
n18:orjk%3A23520
n4:aktivita
n19:P
n4:aktivity
P(GAP108/12/0393)
n4:cisloPeriodika
10
n4:dodaniDat
n12:2014
n4:domaciTvurceVysledku
n6:1975714 n6:7741715 n6:6511333
n4:druhVysledku
n17:J
n4:duvernostUdaju
n15:S
n4:entitaPredkladatele
n9:predkladatel
n4:idSjednocenehoVysledku
111665
n4:idVysledku
RIV/49777513:23520/13:43917963
n4:jazykVysledku
n21:eng
n4:klicovaSlova
Magnetic field; Deposition rate; Non-stationary model; HiPIMS; High-power magnetron sputtering
n4:klicoveSlovo
n20:HiPIMS n20:Non-stationary%20model n20:Deposition%20rate n20:High-power%20magnetron%20sputtering n20:Magnetic%20field
n4:kodStatuVydavatele
GB - Spojené království Velké Británie a Severního Irska
n4:kontrolniKodProRIV
[18E89FE7D316]
n4:nazevZdroje
Journal of Physics D: Applied Physics
n4:obor
n10:BL
n4:pocetDomacichTvurcuVysledku
3
n4:pocetTvurcuVysledku
3
n4:projekt
n5:GAP108%2F12%2F0393
n4:rokUplatneniVysledku
n12:2013
n4:svazekPeriodika
46
n4:tvurceVysledku
Vlček, Jaroslav Kos, Šimon Kozák, Tomáš
n4:wos
000315169500013
s:issn
0022-3727
s:numberOfPages
7
n11:doi
10.1088/0022-3727/46/10/105203
n8:organizacniJednotka
23520