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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F12%3A43914807%21RIV13-MSM-23520___
rdf:type
skos:Concept n14:Vysledek
dcterms:description
We present a model analysis of a high power impulse magnetron sputtering of copper. We use a non-stationary global model based on the particle and energy conservation equations in two zones, which makes it possible to calculate time evolutions of the averaged process gas and target material neutral and ion densities, as well as the fluxes of these particles to the target and substrate during a pulse period. We study the effect of the increasing target power density under conditions corresponding to a real experimental system. The calculated target current waveforms show a long steady state and are in a good agreement with the experimental results. For an increasing target power density, an analysis of the particle densities shows a gradual transition to a metal dominated discharge plasma with an increasing degree of ionization of the depositing flux. We present a model analysis of a high power impulse magnetron sputtering of copper. We use a non-stationary global model based on the particle and energy conservation equations in two zones, which makes it possible to calculate time evolutions of the averaged process gas and target material neutral and ion densities, as well as the fluxes of these particles to the target and substrate during a pulse period. We study the effect of the increasing target power density under conditions corresponding to a real experimental system. The calculated target current waveforms show a long steady state and are in a good agreement with the experimental results. For an increasing target power density, an analysis of the particle densities shows a gradual transition to a metal dominated discharge plasma with an increasing degree of ionization of the depositing flux.
dcterms:title
Effect of the target power density on high power impulse magnetron sputtering of copper Effect of the target power density on high power impulse magnetron sputtering of copper
skos:prefLabel
Effect of the target power density on high power impulse magnetron sputtering of copper Effect of the target power density on high power impulse magnetron sputtering of copper
skos:notation
RIV/49777513:23520/12:43914807!RIV13-MSM-23520___
n14:predkladatel
n16:orjk%3A23520
n7:aktivita
n18:P n18:Z
n7:aktivity
P(OC10045), Z(MSM4977751302)
n7:cisloPeriodika
2
n7:dodaniDat
n11:2013
n7:domaciTvurceVysledku
n8:7741715
n7:druhVysledku
n17:J
n7:duvernostUdaju
n21:S
n7:entitaPredkladatele
n15:predkladatel
n7:idSjednocenehoVysledku
133334
n7:idVysledku
RIV/49777513:23520/12:43914807
n7:jazykVysledku
n13:eng
n7:klicovaSlova
Non-stationary model; HiPIMS; Pulsed sputtering; High-power magnetron sputtering
n7:klicoveSlovo
n9:HiPIMS n9:Pulsed%20sputtering n9:Non-stationary%20model n9:High-power%20magnetron%20sputtering
n7:kodStatuVydavatele
GB - Spojené království Velké Británie a Severního Irska
n7:kontrolniKodProRIV
[3220337A09A0]
n7:nazevZdroje
PLASMA SOURCES SCIENCE & TECHNOLOGY
n7:obor
n10:BL
n7:pocetDomacichTvurcuVysledku
1
n7:pocetTvurcuVysledku
1
n7:projekt
n12:OC10045
n7:rokUplatneniVysledku
n11:2012
n7:svazekPeriodika
21
n7:tvurceVysledku
Kozák, Tomáš
n7:wos
000302779400026
n7:zamer
n19:MSM4977751302
s:issn
0963-0252
s:numberOfPages
12
n20:doi
10.1088/0963-0252/21/2/025012
n3:organizacniJednotka
23520