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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F11%3A43898484%21RIV12-MSM-23520___
rdf:type
n8:Vysledek skos:Concept
dcterms:description
Photocatalytic crystalline TiO2 films were deposited by a pulsed dc dual magnetron system. The depositions were performed using two unbalanced magnetrons with planar titanium targets of 50 mm diameter in Ar+O2 gas mixtures at a total pressure of 0.9 Pa and with the maximum substrate surface temperature of 160 °C. Both magnetrons operated in the asymmetric bipolar pulsed mode. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. The measured structure of the ion energy distributions was correlated with the distinct pulse phases of the magnetron discharges. A decrease in the energy delivered by fast ions to the unit volume of the growing films resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO2 films. Photocatalytic crystalline TiO2 films were deposited by a pulsed dc dual magnetron system. The depositions were performed using two unbalanced magnetrons with planar titanium targets of 50 mm diameter in Ar+O2 gas mixtures at a total pressure of 0.9 Pa and with the maximum substrate surface temperature of 160 °C. Both magnetrons operated in the asymmetric bipolar pulsed mode. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. The measured structure of the ion energy distributions was correlated with the distinct pulse phases of the magnetron discharges. A decrease in the energy delivered by fast ions to the unit volume of the growing films resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO2 films.
dcterms:title
Effect of ion bombarding energies on photocatalytic TiO2 films growing in a pulsed dual magnetron discharge Effect of ion bombarding energies on photocatalytic TiO2 films growing in a pulsed dual magnetron discharge
skos:prefLabel
Effect of ion bombarding energies on photocatalytic TiO2 films growing in a pulsed dual magnetron discharge Effect of ion bombarding energies on photocatalytic TiO2 films growing in a pulsed dual magnetron discharge
skos:notation
RIV/49777513:23520/11:43898484!RIV12-MSM-23520___
n8:predkladatel
n9:orjk%3A23520
n3:aktivita
n15:Z n15:P
n3:aktivity
P(OC10045), Z(MSM4977751302)
n3:cisloPeriodika
3
n3:dodaniDat
n10:2012
n3:domaciTvurceVysledku
n14:1975714
n3:druhVysledku
n18:J
n3:duvernostUdaju
n17:S
n3:entitaPredkladatele
n20:predkladatel
n3:idSjednocenehoVysledku
196317
n3:idVysledku
RIV/49777513:23520/11:43898484
n3:jazykVysledku
n11:eng
n3:klicovaSlova
TiO2 films; pulsed dual magnetron sputtering; photocatalysis; mass spectroscopy; Ion energy distribution function
n3:klicoveSlovo
n5:photocatalysis n5:Ion%20energy%20distribution%20function n5:mass%20spectroscopy n5:TiO2%20films n5:pulsed%20dual%20magnetron%20sputtering
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[ADD27EDA33C6]
n3:nazevZdroje
Journal of Vacuum Science and Technology A
n3:obor
n19:BL
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
2
n3:projekt
n4:OC10045
n3:rokUplatneniVysledku
n10:2011
n3:svazekPeriodika
29
n3:tvurceVysledku
Vlček, Jaroslav Novák, Ondřej
n3:zamer
n21:MSM4977751302
s:issn
0734-2101
s:numberOfPages
7
n16:doi
10.1116/1.3563612
n12:organizacniJednotka
23520