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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F11%3A43898421%21RIV12-MSM-23520___
rdf:type
n5:Vysledek skos:Concept
dcterms:description
Pulsed dc dual magnetron sputtering was used for preparation of photocatalytic crystalline TiO2 films. Both magnetrons operated in the asymmetric bipolar mode at the repetition frequency of 100 kHz. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. A suppression of high-energy ions in the flux onto the substrate resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO2 films. Pulsed dc dual magnetron sputtering was used for preparation of photocatalytic crystalline TiO2 films. Both magnetrons operated in the asymmetric bipolar mode at the repetition frequency of 100 kHz. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. A suppression of high-energy ions in the flux onto the substrate resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO2 films.
dcterms:title
Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films
skos:prefLabel
Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films
skos:notation
RIV/49777513:23520/11:43898421!RIV12-MSM-23520___
n5:predkladatel
n6:orjk%3A23520
n3:aktivita
n13:Z n13:P
n3:aktivity
P(OC10045), Z(MSM4977751302)
n3:cisloPeriodika
3
n3:dodaniDat
n11:2012
n3:domaciTvurceVysledku
n8:8730415 n8:1975714 n8:7018029 n8:4084241
n3:druhVysledku
n18:J
n3:duvernostUdaju
n12:S
n3:entitaPredkladatele
n14:predkladatel
n3:idSjednocenehoVysledku
205788
n3:idVysledku
RIV/49777513:23520/11:43898421
n3:jazykVysledku
n19:eng
n3:klicovaSlova
TiO2 films; pulsed dual magnetron sputtering; photocatalysis; mass spectroscopy; ion energy distribution function
n3:klicoveSlovo
n7:TiO2%20films n7:pulsed%20dual%20magnetron%20sputtering n7:photocatalysis n7:mass%20spectroscopy n7:ion%20energy%20distribution%20function
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[C10FD2C4A3CB]
n3:nazevZdroje
Plasma Processes and Polymers
n3:obor
n9:BL
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
4
n3:projekt
n21:OC10045
n3:rokUplatneniVysledku
n11:2011
n3:svazekPeriodika
8
n3:tvurceVysledku
Šícha, Jan Novák, Ondřej Kudláček, Pavel Vlček, Jaroslav
n3:wos
000289024800002
n3:zamer
n16:MSM4977751302
s:issn
1612-8850
s:numberOfPages
9
n4:doi
10.1002/ppap.201000131
n20:organizacniJednotka
23520