This HTML5 document contains 43 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
dctermshttp://purl.org/dc/terms/
n19http://localhost/temp/predkladatel/
n6http://linked.opendata.cz/resource/domain/vavai/projekt/
n4http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n8http://linked.opendata.cz/resource/domain/vavai/subjekt/
n7http://linked.opendata.cz/ontology/domain/vavai/
n11http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F49777513%3A23520%2F11%3A43895686%21RIV12-MSM-23520___/
n13http://linked.opendata.cz/resource/domain/vavai/zamer/
skoshttp://www.w3.org/2004/02/skos/core#
n3http://linked.opendata.cz/ontology/domain/vavai/riv/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n14http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n17http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n15http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n10http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n18http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n12http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n5http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F11%3A43895686%21RIV12-MSM-23520___
rdf:type
skos:Concept n7:Vysledek
dcterms:description
High-power pulsed dc magnetron sputtering with an effective reactive gas flow control, developed by us, was used for the reactive deposition of transparent zirconium dioxide films. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 2.5% to 10%. The substrate temperatures were less than 300 degrees of Celsius during the depositions of films on a floating substrate at the distance of 100 mm from the target. The increase in the average target power density from 5 to 100 watts per square centimeter in a period at the same duty cycle of 10% resulted in a rapid rise in the deposition rate from 11 nm/min to 73 nm/min. High-power pulsed dc magnetron sputtering with an effective reactive gas flow control, developed by us, was used for the reactive deposition of transparent zirconium dioxide films. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 2.5% to 10%. The substrate temperatures were less than 300 degrees of Celsius during the depositions of films on a floating substrate at the distance of 100 mm from the target. The increase in the average target power density from 5 to 100 watts per square centimeter in a period at the same duty cycle of 10% resulted in a rapid rise in the deposition rate from 11 nm/min to 73 nm/min.
dcterms:title
High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering
skos:prefLabel
High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering
skos:notation
RIV/49777513:23520/11:43895686!RIV12-MSM-23520___
n7:predkladatel
n8:orjk%3A23520
n3:aktivita
n15:P n15:Z
n3:aktivity
P(OC10045), Z(MSM4977751302)
n3:dodaniDat
n5:2012
n3:domaciTvurceVysledku
n4:1975714 n4:8668825 n4:3554392 n4:2650754 n4:9684328
n3:druhVysledku
n12:O
n3:duvernostUdaju
n17:S
n3:entitaPredkladatele
n11:predkladatel
n3:idSjednocenehoVysledku
202088
n3:idVysledku
RIV/49777513:23520/11:43895686
n3:jazykVysledku
n10:eng
n3:klicovaSlova
Zirconium dioxide; HiPIMS; Reactive sputtering; High-rate reactive deposition
n3:klicoveSlovo
n14:HiPIMS n14:Zirconium%20dioxide n14:High-rate%20reactive%20deposition n14:Reactive%20sputtering
n3:kontrolniKodProRIV
[D55602B3B3A7]
n3:obor
n18:BL
n3:pocetDomacichTvurcuVysledku
5
n3:pocetTvurcuVysledku
5
n3:projekt
n6:OC10045
n3:rokUplatneniVysledku
n5:2011
n3:tvurceVysledku
Vlček, Jaroslav Houška, Jiří Lazar, Jan Rezek, Jiří Čerstvý, Radomír
n3:zamer
n13:MSM4977751302
n19:organizacniJednotka
23520