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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F09%3A00501690%21RIV10-MSM-23520___
rdf:type
skos:Concept n13:Vysledek
dcterms:description
Amorphous Si-B-C-N films with two compositions (Si34B9C4N49 and Si36B13C7N40) and low contamination level (H+O+Ar < 4 at.%) were deposited on silicon substrates by reactive dc magnetron co-sputtering using two different targets and gas mixtures. Thermal stability of these films was investigated in terms of composition, bonding structure, as well as mechanical and optical properties after annealing in helium up to the 1300°C substrate limit. Furthermore, both Si-B-C-N materials studied here exhibited extremely high oxidation resistance in air up to the 1300°C substrate limit. Amorphous Si-B-C-N films with two compositions (Si34B9C4N49 and Si36B13C7N40) and low contamination level (H+O+Ar < 4 at.%) were deposited on silicon substrates by reactive dc magnetron co-sputtering using two different targets and gas mixtures. Thermal stability of these films was investigated in terms of composition, bonding structure, as well as mechanical and optical properties after annealing in helium up to the 1300°C substrate limit. Furthermore, both Si-B-C-N materials studied here exhibited extremely high oxidation resistance in air up to the 1300°C substrate limit.
dcterms:title
High-temperature stability of the mechanical and optical properties of Si-B-C-N films prepared by magnetron sputtering High-temperature stability of the mechanical and optical properties of Si-B-C-N films prepared by magnetron sputtering
skos:prefLabel
High-temperature stability of the mechanical and optical properties of Si-B-C-N films prepared by magnetron sputtering High-temperature stability of the mechanical and optical properties of Si-B-C-N films prepared by magnetron sputtering
skos:notation
RIV/49777513:23520/09:00501690!RIV10-MSM-23520___
n3:aktivita
n12:Z
n3:aktivity
Z(MSM4977751302)
n3:cisloPeriodika
1
n3:dodaniDat
n18:2010
n3:domaciTvurceVysledku
n7:6620752 n7:1975714 n7:1577360
n3:druhVysledku
n16:J
n3:duvernostUdaju
n8:S
n3:entitaPredkladatele
n4:predkladatel
n3:idSjednocenehoVysledku
317184
n3:idVysledku
RIV/49777513:23520/09:00501690
n3:jazykVysledku
n17:eng
n3:klicovaSlova
Si-B-C-N films; magnetron co-sputtering; bonding structure; hardness; optical properties; thermal stability
n3:klicoveSlovo
n6:Si-B-C-N%20films n6:bonding%20structure n6:magnetron%20co-sputtering n6:thermal%20stability n6:hardness n6:optical%20properties
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[052488572CE1]
n3:nazevZdroje
Thin Solid Films
n3:obor
n15:BL
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
6
n3:rokUplatneniVysledku
n18:2009
n3:svazekPeriodika
518
n3:tvurceVysledku
Klemberg-Sapieha, Jolanta Vernhes, Richard Kalaš, Jiří Martinů, Ludvík Vlček, Jaroslav Hřeben, Stanislav
n3:wos
000270628800030
n3:zamer
n14:MSM4977751302
s:issn
0040-6090
s:numberOfPages
6
n9:organizacniJednotka
23520