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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F09%3A00501523%21RIV10-MSM-23520___
rdf:type
skos:Concept n14:Vysledek
dcterms:description
We report on the results obtained using time-resolved Langmuir probe measurements in high-power pulsed dc magnetron sputtering discharges. Time evolutions of the electron energy distribution and the local plasma parameters were investigated at a substrate position of 100mm from a planar target of 100mm diameter during a high-rate deposition of copper films. High plasma densities were achieved and the electron energy distributions with two energy groups and sharply truncated high-energy tails were observed. We report on the results obtained using time-resolved Langmuir probe measurements in high-power pulsed dc magnetron sputtering discharges. Time evolutions of the electron energy distribution and the local plasma parameters were investigated at a substrate position of 100mm from a planar target of 100mm diameter during a high-rate deposition of copper films. High plasma densities were achieved and the electron energy distributions with two energy groups and sharply truncated high-energy tails were observed.
dcterms:title
Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges
skos:prefLabel
Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges
skos:notation
RIV/49777513:23520/09:00501523!RIV10-MSM-23520___
n3:aktivita
n17:Z
n3:aktivity
Z(MSM4977751302)
n3:cisloPeriodika
2
n3:dodaniDat
n4:2010
n3:domaciTvurceVysledku
n9:5255252 n9:1975714 n9:8849412 n9:4084241
n3:druhVysledku
n11:J
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n8:predkladatel
n3:idSjednocenehoVysledku
312858
n3:idVysledku
RIV/49777513:23520/09:00501523
n3:jazykVysledku
n18:eng
n3:klicovaSlova
high-power pulsed sputtering; magnetron discharges; Langmuir probe diagnostics; electron energy distributions; Electron temperatures; Plasma densities
n3:klicoveSlovo
n7:magnetron%20discharges n7:Electron%20temperatures n7:Langmuir%20probe%20diagnostics n7:electron%20energy%20distributions n7:high-power%20pulsed%20sputtering n7:Plasma%20densities
n3:kodStatuVydavatele
GB - Spojené království Velké Británie a Severního Irska
n3:kontrolniKodProRIV
[996D59005564]
n3:nazevZdroje
Plasma Sources Science and Technology
n3:obor
n10:BL
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
4
n3:rokUplatneniVysledku
n4:2009
n3:svazekPeriodika
18
n3:tvurceVysledku
Pajdarová, Andrea Dag Lukáš, Jan Kudláček, Pavel Vlček, Jaroslav
n3:wos
000265580800011
n3:zamer
n6:MSM4977751302
s:issn
0963-0252
s:numberOfPages
7
n16:organizacniJednotka
23520