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Namespace Prefixes

PrefixIRI
dctermshttp://purl.org/dc/terms/
n6http://localhost/temp/predkladatel/
n18http://linked.opendata.cz/resource/domain/vavai/projekt/
n17http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n16http://linked.opendata.cz/ontology/domain/vavai/
n9http://linked.opendata.cz/resource/domain/vavai/zamer/
shttp://schema.org/
skoshttp://www.w3.org/2004/02/skos/core#
n3http://linked.opendata.cz/ontology/domain/vavai/riv/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n12http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n11http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n15http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F49777513%3A23520%2F07%3A00000207%21RIV08-MSM-23520___/
n19http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n8http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n14http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n13http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n10http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F07%3A00000207%21RIV08-MSM-23520___
rdf:type
skos:Concept n16:Vysledek
dcterms:description
Two sets of nanocrystalline TiO2 thin films magnetron deposited on glass and silicon substrates have been studied by X-ray scattering and measurements of contact angle of water drop on the film surface. Phase analysis and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. By both thickness dependence of XRD patterns and depth profiling measurements it was found that rutile growths on the substrate and it is transformed to anatase with increasing distance from the substrate. Two sets of nanocrystalline TiO2 thin films magnetron deposited on glass and silicon substrates have been studied by X-ray scattering and measurements of contact angle of water drop on the film surface. Phase analysis and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. By both thickness dependence of XRD patterns and depth profiling measurements it was found that rutile growths on the substrate and it is transformed to anatase with increasing distance from the substrate. Byly provedeny analýzy vlivu tlousťky vrstev TiO2 na jejich fázové složení a hydrofilicitní chování charakterizované poklesem kontaktního úhlu mezi vodou a povrchem vrstev. S využitím XRD analýzy bylo podrobně analyzováno fázové složení, zbytkový stress a na základě reflexe XRD záření byla určena povrchová morfologie připravených vrstev. Bylo zjištěno, že vysokoteplotní krystalová fáze TiO2 rutil je přítomna na rozhraní vrstva substrát a směrem k povrchu vrstvy je transformována na krystalovou fázi anatázu.
dcterms:title
Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering XRD studie růstu vrstev TiO2 připravených magnetronovým naprašováním Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering
skos:prefLabel
Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering XRD studie růstu vrstev TiO2 připravených magnetronovým naprašováním Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering
skos:notation
RIV/49777513:23520/07:00000207!RIV08-MSM-23520___
n3:strany
241
n3:aktivita
n8:Z n8:P
n3:aktivity
P(GA106/06/0327), Z(MSM0021620834), Z(MSM4977751302)
n3:cisloPeriodika
0
n3:dodaniDat
n10:2008
n3:domaciTvurceVysledku
n17:9294368 n17:9269606 n17:8730415
n3:druhVysledku
n14:J
n3:duvernostUdaju
n11:S
n3:entitaPredkladatele
n15:predkladatel
n3:idSjednocenehoVysledku
423697
n3:idVysledku
RIV/49777513:23520/07:00000207
n3:jazykVysledku
n19:eng
n3:klicovaSlova
titanium oxide; thin film growth; X-ray diffraction; thin films
n3:klicoveSlovo
n12:thin%20films n12:X-ray%20diffraction n12:thin%20film%20growth n12:titanium%20oxide
n3:kodStatuVydavatele
DE - Spolková republika Německo
n3:kontrolniKodProRIV
[D199B7672AD8]
n3:nazevZdroje
Zeitschrift für Kristallographie
n3:obor
n13:BL
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
5
n3:projekt
n18:GA106%2F06%2F0327
n3:rokUplatneniVysledku
n10:2007
n3:tvurceVysledku
Heřman, David Šícha, Jan Kužel, Radomír Nichtová, L. Musil, Jindřich
n3:zamer
n9:MSM4977751302 n9:MSM0021620834
s:issn
0044-2968
s:numberOfPages
6
n6:organizacniJednotka
23520