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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F03%3A00000128%21RIV%2F2004%2FMSM%2F235204%2FN
rdf:type
n4:Vysledek skos:Concept
dcterms:description
Hard films are successfully used to improve functional properties of cutting tools and their lifetime. Despite this fact, new demands in machining of advance materials, however, require new films with enhanced properties to be developed. This paper repo rts on results of a systematic investigation of properties of thin Ti(Fe)Nx, films reactively sputtered using an unbalanced dc magnetron. Main advantages of magnetron sputtering are relatively low deposition temperatures and possibility to scale up the deposition process. Important is also the deposition rate aD of the film because it decides on its price. Therefore, this paper is devoted to aD of Ti(Fe)Nx films, their structure and mechanical properties. Hard films are successfully used to improve functional properties of cutting tools and their lifetime. Despite this fact, new demands in machining of advance materials, however, require new films with enhanced properties to be developed. This paper repo rts on results of a systematic investigation of properties of thin Ti(Fe)Nx, films reactively sputtered using an unbalanced dc magnetron. Main advantages of magnetron sputtering are relatively low deposition temperatures and possibility to scale up the deposition process. Important is also the deposition rate aD of the film because it decides on its price. Therefore, this paper is devoted to aD of Ti(Fe)Nx films, their structure and mechanical properties.
dcterms:title
Properties of reactively sputtered hard Ti(Fe)Nx films Properties of reactively sputtered hard Ti(Fe)Nx films
skos:prefLabel
Properties of reactively sputtered hard Ti(Fe)Nx films Properties of reactively sputtered hard Ti(Fe)Nx films
skos:notation
RIV/49777513:23520/03:00000128!RIV/2004/MSM/235204/N
n3:strany
12-15
n3:aktivita
n19:P n19:Z
n3:aktivity
P(ME 529), Z(MSM 235200002)
n3:dodaniDat
n20:2004
n3:domaciTvurceVysledku
n16:9269606 n16:7084617
n3:druhVysledku
n10:D
n3:duvernostUdaju
n21:S
n3:entitaPredkladatele
n13:predkladatel
n3:idSjednocenehoVysledku
623885
n3:idVysledku
RIV/49777513:23520/03:00000128
n3:jazykVysledku
n15:eng
n3:klicovaSlova
Ti(Fe)Nx films;structure;mechanical properties;magnetron sputtering
n3:klicoveSlovo
n6:mechanical%20properties n6:Ti%28Fe%29Nx%20films n6:structure n6:magnetron%20sputtering
n3:kontrolniKodProRIV
[37ADD90BF54B]
n3:mistoKonaniAkce
Brno
n3:mistoVydani
Brno
n3:nazevZdroje
JUNIORMAT ’03
n3:obor
n18:BL
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
2
n3:pocetUcastnikuAkce
0
n3:pocetZahranicnichUcastnikuAkce
0
n3:projekt
n7:ME%20529
n3:rokUplatneniVysledku
n20:2003
n3:tvurceVysledku
Musil, Jindřich Šůna, Jan
n3:typAkce
n11:EUR
n3:zahajeniAkce
2003-09-23+02:00
n3:zamer
n9:MSM%20235200002
s:numberOfPages
4
n14:hasPublisher
University of Technology
n22:isbn
80-214-2462-1
n17:organizacniJednotka
23520