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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F03%3A00000090%21RIV07-MSM-23520___
rdf:type
n13:Vysledek skos:Concept
dcterms:description
The paper presents a detailed analysis of structure-hardness relations in hard and superhard nanostructured Ti(Al,V)Nx films with a low content of Al(5 at.%)and V(2 at.%). The Ti(Al,V)Nx films were prepared by d.c. reactive magnetron sputtering. Special attention is devoted to the energy Epi delivered to the growing film by bombarding ions. It was found that Ti(Al,V)Nx films form a superhard material with hardness H>40 GPa; superhard Ti(Al,V)Nx films are: poly-oriented films characterized with at least two broad, low-intensity X-ray reflections, i.e. are composed of small grains of different crystallographic orientations. The paper presents a detailed analysis of structure-hardness relations in hard and superhard nanostructured Ti(Al,V)Nx films with a low content of Al(5 at.%)and V(2 at.%). The Ti(Al,V)Nx films were prepared by d.c. reactive magnetron sputtering. Special attention is devoted to the energy Epi delivered to the growing film by bombarding ions. It was found that Ti(Al,V)Nx films form a superhard material with hardness H>40 GPa; superhard Ti(Al,V)Nx films are: poly-oriented films characterized with at least two broad, low-intensity X-ray reflections, i.e. are composed of small grains of different crystallographic orientations. Článek představuje detailní analýzu závislosti tvrdosti na struktuře naprašovaných tvrdých a supertvrdých nanostrukturních Ti(Al,V)Nx vrstev. Důležitým faktorem nutným pro tvorbu supertvrdých vrstev byla energie dodaná vrstvě dopadajícími ionty Epi. Vytvořené vrstvy měly tvrdost H  40 GPa, nízké tlakové pnutí  ≤ -2 GPa a byly vytvořeny při celkovém tlaku pT = 0.5 Pa a energii Epi  0.5 MJ/cm3. Bylo ukázáno, že supertvrdý nanostrukturní materiál může být tvořen zrny jednoho materiálu s různou krystalografickou orientací.
dcterms:title
Závislost tvrdosti na struktuře naprašovaných Ti-Al-V-N vrstev Structure-hardness relations in sputtered Ti-Al-V-N films Structure-hardness relations in sputtered Ti-Al-V-N films
skos:prefLabel
Structure-hardness relations in sputtered Ti-Al-V-N films Structure-hardness relations in sputtered Ti-Al-V-N films Závislost tvrdosti na struktuře naprašovaných Ti-Al-V-N vrstev
skos:notation
RIV/49777513:23520/03:00000090!RIV07-MSM-23520___
n3:strany
189
n3:aktivita
n5:Z n5:P
n3:aktivity
P(ME 529), Z(MSM 235200002)
n3:cisloPeriodika
0
n3:dodaniDat
n9:2007
n3:domaciTvurceVysledku
n16:1975714 n16:6182607 n16:9269606
n3:druhVysledku
n17:J
n3:duvernostUdaju
n18:S
n3:entitaPredkladatele
n14:predkladatel
n3:idSjednocenehoVysledku
629284
n3:idVysledku
RIV/49777513:23520/03:00000090
n3:jazykVysledku
n10:eng
n3:klicovaSlova
Ti-Al-V-N nanostructured films; structure; hardness; chemical composition; mechanical properties; magnetron sputtering
n3:klicoveSlovo
n8:chemical%20composition n8:structure n8:magnetron%20sputtering n8:mechanical%20properties n8:Ti-Al-V-N%20nanostructured%20films n8:hardness
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[46F71A040A84]
n3:nazevZdroje
Thin Solid Films
n3:obor
n11:BL
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
5
n3:projekt
n4:ME%20529
n3:rokUplatneniVysledku
n9:2003
n3:tvurceVysledku
Musil, Jindřich Alaart, Jan Vlček, Jaroslav Mitterer, Christian Poláková, Helena
n3:zamer
n19:MSM%20235200002
s:issn
0040-6090
s:numberOfPages
10
n6:organizacniJednotka
23520