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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F03%3A00000042%21RIV%2F2004%2FMSM%2F235204%2FN
rdf:type
n9:Vysledek skos:Concept
dcterms:description
Pulsed dc magnetron sputtering gives us new possibilities in deposition processes, because it allows to form films under new physical conditions, e.g. at high deposition rates, at highly ionized fluxes of sputtered particles and at a possible simultaneo usputtering and evaporation of a target. The aim of this work is to investigate the relative densities of argon (working gas) atoms and ions, and copper (target) atoms and ions in front of a sputtered target during voltage pulses and in pauses between them. Pulsed dc magnetron sputtering gives us new possibilities in deposition processes, because it allows to form films under new physical conditions, e.g. at high deposition rates, at highly ionized fluxes of sputtered particles and at a possible simultaneo usputtering and evaporation of a target. The aim of this work is to investigate the relative densities of argon (working gas) atoms and ions, and copper (target) atoms and ions in front of a sputtered target during voltage pulses and in pauses between them.
dcterms:title
Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy
skos:prefLabel
Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy
skos:notation
RIV/49777513:23520/03:00000042!RIV/2004/MSM/235204/N
n3:strany
124-125
n3:aktivita
n8:Z
n3:aktivity
Z(MSM 235200002)
n3:dodaniDat
n19:2004
n3:domaciTvurceVysledku
n5:3010147 n5:9269606 n5:7922051 n5:5255252 n5:1975714
n3:druhVysledku
n15:D
n3:duvernostUdaju
n7:S
n3:entitaPredkladatele
n10:predkladatel
n3:idSjednocenehoVysledku
600951
n3:idVysledku
RIV/49777513:23520/03:00000042
n3:jazykVysledku
n14:eng
n3:klicovaSlova
pulsed magnetron sputtering;optical emission spectroscopy
n3:klicoveSlovo
n4:pulsed%20magnetron%20sputtering n4:optical%20emission%20spectroscopy
n3:kontrolniKodProRIV
[670E9C4E4149]
n3:mistoKonaniAkce
Liptovský Mikuláš
n3:mistoVydani
Liptovský Mikuláš
n3:nazevZdroje
Proceedings of the XIVth Symposium on Application of Plasma Processes
n3:obor
n21:BL
n3:pocetDomacichTvurcuVysledku
5
n3:pocetTvurcuVysledku
5
n3:pocetUcastnikuAkce
0
n3:pocetZahranicnichUcastnikuAkce
0
n3:rokUplatneniVysledku
n19:2003
n3:tvurceVysledku
Pajdarová, Andrea Dag Leština, Jan Vlček, Jaroslav Bělský, Petr Musil, Jindřich
n3:typAkce
n11:WRD
n3:zahajeniAkce
2003-01-13+01:00
n3:zamer
n16:MSM%20235200002
s:numberOfPages
2
n12:hasPublisher
Military Academy
n17:isbn
80-8040-195-0
n18:organizacniJednotka
23520