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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F02%3A00070767%21RIV%2F2003%2FMSM%2F235203%2FN
rdf:type
skos:Concept n19:Vysledek
dcterms:description
The paper deals with pulsed dc magnetron discharges proposed for ionized and high-rate sputtering of thin films. Time-resolved optical emission spectroscopy was used to characterize the ionization degree of copper (target) and argon (working gas) atoms, and the relative density of copper atoms in front of a sputtered copper target and in a plasma bulk during pulses. Energy-resolved mass spetroscopy with time resolution was carried out in front of a substrate to investigate the energy distribution of copper and argon ions, and their fractions in ion fluxes on the grounded substrate. The paper deals with pulsed dc magnetron discharges proposed for ionized and high-rate sputtering of thin films. Time-resolved optical emission spectroscopy was used to characterize the ionization degree of copper (target) and argon (working gas) atoms, and the relative density of copper atoms in front of a sputtered copper target and in a plasma bulk during pulses. Energy-resolved mass spetroscopy with time resolution was carried out in front of a substrate to investigate the energy distribution of copper and argon ions, and their fractions in ion fluxes on the grounded substrate.
dcterms:title
Optical emission spectroscopy and energy-resolved mass spectroscopy in pulsed dc magnetron discharges for ionized high-rate sputtering Optical emission spectroscopy and energy-resolved mass spectroscopy in pulsed dc magnetron discharges for ionized high-rate sputtering
skos:prefLabel
Optical emission spectroscopy and energy-resolved mass spectroscopy in pulsed dc magnetron discharges for ionized high-rate sputtering Optical emission spectroscopy and energy-resolved mass spectroscopy in pulsed dc magnetron discharges for ionized high-rate sputtering
skos:notation
RIV/49777513:23520/02:00070767!RIV/2003/MSM/235203/N
n3:strany
92
n3:aktivita
n5:P n5:Z
n3:aktivity
P(ME 203), Z(MSM 235200002)
n3:dodaniDat
n8:2003
n3:domaciTvurceVysledku
n12:1975714 n12:5255252 n12:7922051
n3:druhVysledku
n21:D
n3:duvernostUdaju
n13:S
n3:entitaPredkladatele
n14:predkladatel
n3:idSjednocenehoVysledku
657154
n3:idVysledku
RIV/49777513:23520/02:00070767
n3:jazykVysledku
n17:eng
n3:klicovaSlova
magnetron sputtering;optical emission spectroscopy
n3:klicoveSlovo
n9:optical%20emission%20spectroscopy n9:magnetron%20sputtering
n3:kontrolniKodProRIV
[8E069195BF77]
n3:mistoKonaniAkce
Liverpool
n3:mistoVydani
Liverpool
n3:nazevZdroje
Optical emission spectroscopy and energy-resolved mass spectroscopy in pulsed dc magnetron discharges for ionized high-rate sputtering
n3:obor
n15:BL
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
5
n3:pocetUcastnikuAkce
0
n3:pocetZahranicnichUcastnikuAkce
0
n3:projekt
n6:ME%20203
n3:rokUplatneniVysledku
n8:2002
n3:tvurceVysledku
Pajdarová, Andrea Dagmar Vlček, Jaroslav Leština, Jan
n3:typAkce
n11:CST
n3:zahajeniAkce
2002-01-01+01:00
n3:zamer
n22:MSM%20235200002
s:numberOfPages
4
n10:hasPublisher
University of Liverpool
n16:isbn
0-9539105-1-2
n18:organizacniJednotka
23520