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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F02%3A00000091%21RIV07-MSM-23520___
rdf:type
skos:Concept n18:Vysledek
dcterms:description
Vrstvy W-Ti-N byly deponovány technikou reaktivní DC magnetronové depozice. Krystalová struktura, mikrostruktura, složení, tvrdost a zbytkov0 pnutí byly studovány jako funkce parciálního tlaku dusíku. Tyto vrstvy vykazují tvrdost v rozsahu od 25 GPa ( [N]= 0) až do 63 GPa ([N]=25 at.% ) a zbytkové pnutí v rozsahu od -1.3 GPa až do -5.7 GPa. Největší tvrdost byla nalezena ve vrstvách, které splňovaly následující podmínky: (i) přítomnost dvou krystalických fází, (ii) velké mikropnutí , a (iii) relativně nízké tlakové zbytkové pnutí. W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, micro-hardness and residual stress were studied as a function of the partial pressure of nitrogen. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. The maximum microhardness was found in films that simultaneously possessed: 1.the presence of two crystalline phases; 2.large microstrain; and 3.relatively low compressive residual stress. W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, micro-hardness and residual stress were studied as a function of the partial pressure of nitrogen. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. The maximum microhardness was found in films that simultaneously possessed: 1.the presence of two crystalline phases; 2.large microstrain; and 3.relatively low compressive residual stress.
dcterms:title
Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering Složení, struktura, mikrotvrdost a zbytkové pnutí W-Ti-N vrstev deponovaných reaktivním magnetronovým naprašováním
skos:prefLabel
Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering Složení, struktura, mikrotvrdost a zbytkové pnutí W-Ti-N vrstev deponovaných reaktivním magnetronovým naprašováním Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering
skos:notation
RIV/49777513:23520/02:00000091!RIV07-MSM-23520___
n3:strany
136
n3:aktivita
n17:Z
n3:aktivity
Z(MSM 235200002)
n3:cisloPeriodika
0
n3:dodaniDat
n12:2007
n3:domaciTvurceVysledku
n8:9269606
n3:druhVysledku
n4:J
n3:duvernostUdaju
n16:S
n3:entitaPredkladatele
n14:predkladatel
n3:idSjednocenehoVysledku
641431
n3:idVysledku
RIV/49777513:23520/02:00000091
n3:jazykVysledku
n11:eng
n3:klicovaSlova
hardness; sputtering; nitrides; alloys
n3:klicoveSlovo
n9:sputtering n9:nitrides n9:hardness n9:alloys
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[429C6771AF00]
n3:nazevZdroje
Thin Solid Films
n3:obor
n7:BL
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
6
n3:rokUplatneniVysledku
n12:2002
n3:tvurceVysledku
Regent, F. Musil, Jindřich Zemek, Josef Mišina, Martin Shaginyan, L. R. Britun, V. F.
n3:zamer
n15:MSM%20235200002
s:issn
0040-6090
s:numberOfPages
12
n5:organizacniJednotka
23520