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Statements

Subject Item
n2:RIV%2F49777513%3A23520%2F01%3A00064893%21RIV%2F2002%2FGA0%2F235202%2FN
rdf:type
skos:Concept n19:Vysledek
dcterms:description
The paper describes two methods which can be used to control the film structure: (1) the energy delivered to the growing film, i.e. (i) substrate heating and (ii) ion bombardment; and (2) the interlayer inserted between the substrate and the film. These methods were tested on Cu and Zr-Y-N films and Cu and Cr-Ni-N films used as interlayers. It was found that both methods can improve the crystallinity of sputter deposited films. Dependences of the film structure on substrate temperature, negative substrate bias and substrate ion current density are given. The effect of the interlayer on the structure of the deposited film is also clearly demonstrated. The paper describes two methods which can be used to control the film structure: (1) the energy delivered to the growing film, i.e. (i) substrate heating and (ii) ion bombardment; and (2) the interlayer inserted between the substrate and the film. These methods were tested on Cu and Zr-Y-N films and Cu and Cr-Ni-N films used as interlayers. It was found that both methods can improve the crystallinity of sputter deposited films. Dependences of the film structure on substrate temperature, negative substrate bias and substrate ion current density are given. The effect of the interlayer on the structure of the deposited film is also clearly demonstrated.
dcterms:title
Control of structure in magnetron sputtered thin film Control of structure in magnetron sputtered thin film
skos:prefLabel
Control of structure in magnetron sputtered thin film Control of structure in magnetron sputtered thin film
skos:notation
RIV/49777513:23520/01:00064893!RIV/2002/GA0/235202/N
n3:strany
s. 201-205
n3:aktivita
n14:P n14:Z
n3:aktivity
P(GV106/96/K245), P(ME 173), P(ME 203), Z(MSM 235200002)
n3:cisloPeriodika
leden
n3:dodaniDat
n8:2002
n3:domaciTvurceVysledku
n5:5660408 n5:9684328 n5:9269606 n5:6182607
n3:druhVysledku
n9:J
n3:duvernostUdaju
n18:S
n3:entitaPredkladatele
n15:predkladatel
n3:idSjednocenehoVysledku
676411
n3:idVysledku
RIV/49777513:23520/01:00064893
n3:jazykVysledku
n12:eng
n3:klicovaSlova
Structure; Energy delivered to the growing film; Interlayer; Magnetron sputtering
n3:klicoveSlovo
n4:Energy%20delivered%20to%20the%20growing%20film n4:Interlayer n4:Magnetron%20sputtering n4:Structure
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[2ED82B438F90]
n3:nazevZdroje
Surface and Coatings Technology
n3:obor
n13:BL
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
4
n3:pocetUcastnikuAkce
0
n3:pocetZahranicnichUcastnikuAkce
0
n3:projekt
n7:ME%20173 n7:ME%20203 n7:GV106%2F96%2FK245
n3:rokUplatneniVysledku
n8:2001
n3:svazekPeriodika
Vol. 142
n3:tvurceVysledku
Kubásek, Milan Čerstvý, Radomír Poláková, Helena Musil, Jindřich
n3:zamer
n17:MSM%20235200002
s:issn
0257-8972
s:numberOfPages
5
n10:organizacniJednotka
23520