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Statements

Subject Item
n2:RIV%2F46747885%3A24210%2F04%3A24210172%21RIV%2F2005%2FMSM%2F242105%2FN
rdf:type
n9:Vysledek skos:Concept
dcterms:description
Složení a struktura tenkých vrstev jsou určeny vylučovací metodou a vylučovacími parametry. Vlastnosti povlaků zahrnující jejich tribologické, optické. elektrické a jiné vlastnosti jsou úzce spojeny s jejich složením a strukturou, což znamená, že jejichunkčnost je přímo určena použitou vylučovací metodou. Composition and structure of thin layers are determined by deposition method and deposition parameters. Properties of coatings involving mechanical, tribological, optical, electri- cal, and other properties are closely connected to their compo- sition anstructure which means that their functionality is directly determined by the used deposition method. One of the new and very interesting coatings is the titanium oxide thin film. Large application of this film involves protective hard coatings on cuttingtool, optical films for optical filters or photo-catalytic layers. Each application set different demands on the film properties. The aim of the presented work is a comparison of titanium oxide coatings deposited by physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD) from various precursors. The films were characterized by various techniques including measurements of hardness and thickness by the ball-and-crater method (Calotest). Composition and structure of thin layers are determined by deposition method and deposition parameters. Properties of coatings involving mechanical, tribological, optical, electri- cal, and other properties are closely connected to their compo- sition anstructure which means that their functionality is directly determined by the used deposition method. One of the new and very interesting coatings is the titanium oxide thin film. Large application of this film involves protective hard coatings on cuttingtool, optical films for optical filters or photo-catalytic layers. Each application set different demands on the film properties. The aim of the presented work is a comparison of titanium oxide coatings deposited by physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD) from various precursors. The films were characterized by various techniques including measurements of hardness and thickness by the ball-and-crater method (Calotest).
dcterms:title
Comparison of titanium oxide coatings deposited by PVD and PECVD. Comparison of titanium oxide coatings deposited by PVD and PECVD. Porovnání povlaků oxidu titanu vyloučených PVD a PECVD.
skos:prefLabel
Comparison of titanium oxide coatings deposited by PVD and PECVD. Comparison of titanium oxide coatings deposited by PVD and PECVD. Porovnání povlaků oxidu titanu vyloučených PVD a PECVD.
skos:notation
RIV/46747885:24210/04:24210172!RIV/2005/MSM/242105/N
n3:strany
%2246;49%22
n3:aktivita
n16:Z
n3:aktivity
Z(MSM 242100002)
n3:dodaniDat
n11:2005
n3:domaciTvurceVysledku
n14:9384065 n14:3377229 n14:8216762
n3:druhVysledku
n19:D
n3:duvernostUdaju
n13:S
n3:entitaPredkladatele
n12:predkladatel
n3:idSjednocenehoVysledku
558335
n3:idVysledku
RIV/46747885:24210/04:24210172
n3:jazykVysledku
n18:eng
n3:klicovaSlova
%22TiOx;PVD;PECVD;tribology%22
n3:klicoveSlovo
n10:PVD n10:PECVD n10:tribology%2522 n10:%2522TiOx
n3:kontrolniKodProRIV
[569CD9EAF1BF]
n3:mistoKonaniAkce
Dallas, USA
n3:mistoVydani
Dallas, USA
n3:nazevZdroje
47th SVC Annual Technical Conference Proceeding
n3:obor
n17:JK
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
7
n3:rokUplatneniVysledku
n11:2004
n3:tvurceVysledku
Špatenka, Petr Kolouch, Aleš Polcar, Tomáš Krumeich, Jorg Ganev, N. Macková, Anna Karásek, Jiří
n3:typAkce
n20:WRD
n3:zahajeniAkce
2004-01-01+01:00
n3:zamer
n5:MSM%20242100002
s:numberOfPages
4
n8:hasPublisher
Society of Vacuum Coaters
n15:organizacniJednotka
24210