This HTML5 document contains 42 embedded RDF statements represented using HTML+Microdata notation.

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Namespace Prefixes

PrefixIRI
n13http://linked.opendata.cz/ontology/domain/vavai/riv/typAkce/
dctermshttp://purl.org/dc/terms/
n15http://localhost/temp/predkladatel/
n3http://purl.org/net/nknouf/ns/bibtex#
n17http://linked.opendata.cz/resource/domain/vavai/projekt/
n14http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n19http://linked.opendata.cz/ontology/domain/vavai/
shttp://schema.org/
skoshttp://www.w3.org/2004/02/skos/core#
n4http://linked.opendata.cz/ontology/domain/vavai/riv/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
n18http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F44555601%3A13430%2F03%3A00002341%21RIV%2F2004%2FMSM%2F134304%2FN/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n9http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n16http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n11http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n5http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n20http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n6http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n12http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F44555601%3A13430%2F03%3A00002341%21RIV%2F2004%2FMSM%2F134304%2FN
rdf:type
skos:Concept n19:Vysledek
dcterms:description
Thin SnO2 films have wide range of applications (electronics, special coatings, etc.). Mostly, it is used when conductivity and transparency is required or in gas sensors. Tin oxide films can be prepared by many techniques such as chemical vapour deposition, spray pyrolysis, evaporation, and sputtering [1,2]. We have studied properties of SnO2 thin films produced by a thermal evaporation of Sn films followed by in situ plasma oxidation 3 . The structure of such SnO2 films and also their chemical and physical properties depend on parameters governing the growth during plasma oxidation, e.g. on both the plasma parameters and the substrate temperature. The influence of annealing and substrate heating during oxidation on the surface structure, composition, and electrical conductance of SnO2 films were studied. Thin SnO2 films have wide range of applications (electronics, special coatings, etc.). Mostly, it is used when conductivity and transparency is required or in gas sensors. Tin oxide films can be prepared by many techniques such as chemical vapour deposition, spray pyrolysis, evaporation, and sputtering [1,2]. We have studied properties of SnO2 thin films produced by a thermal evaporation of Sn films followed by in situ plasma oxidation 3 . The structure of such SnO2 films and also their chemical and physical properties depend on parameters governing the growth during plasma oxidation, e.g. on both the plasma parameters and the substrate temperature. The influence of annealing and substrate heating during oxidation on the surface structure, composition, and electrical conductance of SnO2 films were studied.
dcterms:title
Preparation and Characterization of SnO2 Films Preparation and Characterization of SnO2 Films
skos:prefLabel
Preparation and Characterization of SnO2 Films Preparation and Characterization of SnO2 Films
skos:notation
RIV/44555601:13430/03:00002341!RIV/2004/MSM/134304/N
n4:strany
20
n4:aktivita
n5:P
n4:aktivity
P(OC 527.50)
n4:dodaniDat
n12:2004
n4:domaciTvurceVysledku
n14:5664233
n4:druhVysledku
n6:D
n4:duvernostUdaju
n16:S
n4:entitaPredkladatele
n18:predkladatel
n4:idSjednocenehoVysledku
622685
n4:idVysledku
RIV/44555601:13430/03:00002341
n4:jazykVysledku
n11:eng
n4:klicovaSlova
oxidation, SnO2
n4:klicoveSlovo
n9:oxidation n9:SnO2
n4:kontrolniKodProRIV
[86C5DAE231C8]
n4:mistoKonaniAkce
Kagoshima - Japan
n4:mistoVydani
Kaghoshima
n4:nazevZdroje
The 41st Symposium on Basic of Ceramics
n4:obor
n20:BL
n4:pocetDomacichTvurcuVysledku
1
n4:pocetTvurcuVysledku
3
n4:pocetUcastnikuAkce
0
n4:pocetZahranicnichUcastnikuAkce
0
n4:projekt
n17:OC%20527.50
n4:rokUplatneniVysledku
n12:2003
n4:tvurceVysledku
Strýhal, Zdeněk Haneda, Hajime Hishita, Shunichi
n4:typAkce
n13:WRD
n4:zahajeniAkce
2003-01-22+01:00
s:numberOfPages
1
n3:hasPublisher
Ceramic Society of Japan
n15:organizacniJednotka
13430