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Statements

Subject Item
n2:RIV%2F44555601%3A13430%2F01%3A00001470%21RIV%2F2002%2FMSM%2F134302%2FN
rdf:type
skos:Concept n21:Vysledek
dcterms:description
In this work, we have studied surface properties of SnO2 thin films produced by thermal evaporation of Sn films followed by in situ plasma oxidation. The dependence of surface properties on technological parameters was studied by Atomic Force Microscopy (AFM). The experimental results describe the dependence of surface topology on substrate properties, on evaporating conditions and on parameters of plasma oxidation (e.g. plasma parameters, oxidation time and voltage bias applied to the substrate during oxidation). In this work, we have studied surface properties of SnO2 thin films produced by thermal evaporation of Sn films followed by in situ plasma oxidation. The dependence of surface properties on technological parameters was studied by Atomic Force Microscopy (AFM). The experimental results describe the dependence of surface topology on substrate properties, on evaporating conditions and on parameters of plasma oxidation (e.g. plasma parameters, oxidation time and voltage bias applied to the substrate during oxidation).
dcterms:title
AFM Investigations of SnO2 Thin Films Prepared by Plasma Oxidation AFM Investigations of SnO2 Thin Films Prepared by Plasma Oxidation
skos:prefLabel
AFM Investigations of SnO2 Thin Films Prepared by Plasma Oxidation AFM Investigations of SnO2 Thin Films Prepared by Plasma Oxidation
skos:notation
RIV/44555601:13430/01:00001470!RIV/2002/MSM/134302/N
n3:strany
101
n3:aktivita
n8:Z n8:P
n3:aktivity
P(OK 401), Z(MSM 134300001)
n3:dodaniDat
n9:2002
n3:domaciTvurceVysledku
n10:5664233 n10:9042989 n10:8822646
n3:druhVysledku
n17:D
n3:duvernostUdaju
n4:S
n3:entitaPredkladatele
n19:predkladatel
n3:idSjednocenehoVysledku
672667
n3:idVysledku
RIV/44555601:13430/01:00001470
n3:jazykVysledku
n16:eng
n3:klicovaSlova
Plasma oxidation, SnO2, AFM
n3:klicoveSlovo
n11:Plasma%20oxidation n11:SnO2 n11:AFM
n3:kontrolniKodProRIV
[AC21A3B41254]
n3:mistoKonaniAkce
Madrid
n3:mistoVydani
Madrid
n3:nazevZdroje
Proc. 7th European Vacuum Conference and 3rd European Topical Conference on Hard Coiatings - EVC - 7 and ETCH - 3
n3:obor
n12:BL
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
3
n3:pocetUcastnikuAkce
0
n3:pocetZahranicnichUcastnikuAkce
0
n3:projekt
n20:OK%20401
n3:rokUplatneniVysledku
n9:2001
n3:tvurceVysledku
Strýhal, Zdeněk Novák, Stanislav Pavlík, Jaroslav
n3:typAkce
n6:EUR
n3:zahajeniAkce
2001-09-17+02:00
n3:zamer
n5:MSM%20134300001
s:numberOfPages
1
n15:hasPublisher
Aseva
n14:organizacniJednotka
13430